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Showing 1 to 20 of 149 for “"Vapour Deposition"”.
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Organometallic chemical vapour deposition of lead zirconate titanate
Contains fulltext : mmubn000001_202791726.pdf (Publisher’s version ) (Open Access)
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Characterization of carbon nanotubes grown by chemical vapour deposition
… Arc-discharge, laser ablation (LA) and chemical vapour deposition (CVD). In the present work CNTs were grown from a mixture of camphor (C10H16O) and ferrocene (C10H10Fe) using Chemical Vapour Deposition (CVD) and argon was used as a carrier gas. The iron particles from ferrocene acted as …
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Chemical vapour deposition of complex ferroic oxide thin films
Herein is presented a novel chemical vapour deposition (CVD) route for the fabrication of oxide ferroelectrics. A versatile layer-by-layer growth mode was developed to prepare naturally super-latticed bismuth based materials belonging to the Aurivillius phase family, with which good control over …
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Structure and kinetics in the chemical vapour deposition of silicon
Contains fulltext : mmubn000001_027499251.pdf (Publisher’s version ) (Open Access)
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The chemical vapour deposition of Tetraethoxysilane on Zeolite ZSM-5
… on the investigation of a cyclic chemical vapour deposition (CVD) method eliminating unwanted surface reactions and enhancing shape selective properties by depositing inert silica onto the external surface of zeolite ZSM-5. A CVD treatment consists out of a deposition, flushing and heating …
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Development of germanium based sulphide glass by chemical vapour deposition (CVD)
Chalcogenide glasses, especially sulphide glasses, are becoming more and more important for the fabrication of optoelectronic devices in part because of the high nonlinearity, strong photosensitivity and several other unique properties they have. Chalcogenide glasses are normally fabricated by a …
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CU-CATALYZED CHEMICAL VAPOUR DEPOSITION OF GRAPHENE: SYNTHESIS, CHARACTERIZATION AND GROWTH KINETICS
… a variety of applications. Cu-catalyzed chemical vapour deposition (Cu-CVD) is promising for large scale production of high quality monolayer graphene. But the existing Cu-CVD technology is not ready for industry-level production. It still needs to be improved on some aspects, three of which …
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Predictive Model of Cap Formation for Carbon Nanotube Synthesis via Chemical Vapour Deposition
… and dewetting of graphene caps via chemical vapour deposition. This model will allow us to predict the conditions which favour the production of carbon nanotubes with a specific chirality. To model the growth of graphene caps wetted to a metallic catalyst particle, we use the calculus of …
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Calcium vapour deposition on semiconducting polymers studied by adsorption calorimetry and visible light absorption
A novel UHV microcalorimeter has been used to study the interaction between calcium and three polymers: MEH-PPV, MEH-PPP and P3HT. All three polymers behave differently in their reaction kinetics with calcium. On MEH-PPV we measure 45 μJ/cm² of heat generated in excess of the heat of bulk metal …
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On the mechanism of carbon nanotube formation by means of catalytic chemical vapour deposition
… filament growth [1, 2], derived from concepts of vapour-liquid-solid theory, also applies to CNT growth. However, this model fails to account for the growth of CNTs from noble metal [3{7], ceramic [8, 9] and semiconducting nanoparticles [10{13], all of which are regarded as unable to catalyse the …
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Functional Oxides in Optical and Electronic Applications by Atmospheric Pressure Spatial Chemical Vapour Deposition
… WO3 thin films can be prepared using multiple deposition techniques, including sputtering, thermal evaporation, and spray pyrolysis. However, the use of Atmo spheric Pressure Spatial Chemical Vapour Deposition (AP-SCVD) has emerged as a promising method due to its simplicity and scalability. …
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The growth and characterisation of supported metal catalysts prepared by novel chemical vapour deposition methods
… with thermal and combustion chemical vapour depositionwith focus on the liquid phase methods in general and depositionprecipitation in particular. The effects of variant reaction conditions,like pH of precipitation, effects of support, and the influence of otherrelated parameters will …
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Hot-wire chemical vapour deposition of nanocrystalline silicon and silicon nitride : growth mechanisms and filament stability
… filament stability during the hot-wire chemical vapour deposition (HWCVD) of nc-Si:H and SiNₓ thin films. During the HWCVD of nc-Si:H, electron backscatter diffraction (EBSD) revealed that the tantalum (Ta) filament aged to consists of a recrystallized Ta-core with Ta-rich silicides at the hotter …
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A study of hydrogenated nanocrystalline silicon thin films deposited by hot-wire chemical vapour deposition (HWCVD)
… deposited by means of the hot – wire chemical vapour deposition (HWCVD) technique and have been characterised for their performance. It is noticed that hydrogenated nanocrystalline silicon is similar in some aspects (mainly optical) to its counterpart amorphous silicon actually used as the …
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The inertisation of the zeolites ZSM-5, mordenite and beta by chemical vapour deposition using tetraethoxysilane
… good zeolite to study in this regard. Chemical vapour deposition (CVD) and chemical liquid deposition (CLD) methods have shown great promise in inertising the external surface acidity of zeolites and thus increasing their selectivity for various reactions. The external surface acidity can be …
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Chemical vapour deposition and investigation of thin films of oxide materials for electro- and photo- catalytical applications /
… and photocatalytic oxide materials from chemical vapour phase and layers properties were investigated. Deposition of Cd2SnO4 thin films using simple aerosol pyrolysis method was studied for the first time. The influence of various deposition conditions to films properties was established, films …
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Application of the transformation of 1,2,4-Trimethylbenzene to monitor the chemical vapour deposition of Tetraethoxysilane over ZSM-5
The present work reports an improved chemical vapour deposition (CVD) technique using low temperature, tetraethoxysilane (TEOS) and repeated CVD-calcination cycles. This results in a better control of the external surface activity and the pore mouth size of ZSM-5. In search for effective …
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