Global ETD Search
Search theses and dissertations gathered from participating repositories worldwide. Every result links back to the library that holds it. No account is needed.
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Showing 1 to 20 of 653 for “"Vapor Deposition"”.
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Particle generation in a chemical vapor deposition/plasma-enhanced chemical vapor deposition interlayer dielectric tool
… the layer. In this study, particle generation, deposition, and adhesion mechanisms are reviewed. In particular, four important sources of interlayer dielectric particle contamination were investigated: the cleanroom environment, improper wafer handling, the backside of the wafer, and microarcing …
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Chemical vapor deposition of polymeric films
… stability. In this project, chemical vapor deposition (CVD) and plasma enhanced chemical vapor deposition (PECVD) of carbon films with PPN structure using PTCDA as precursor were carried out under different conditions. There is only limited information in literature on the synthesis of …
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Precursors for copper chemical vapor deposition
… copper films of high quality by chemical vapor deposition (CVD). We investigated some copper(I) and copper(II) complexes as precursors for chemical or photochemical vapor deposition. In chapter 2, we synthesized a series of Cu(hfac)<sub>2</sub>(amine) adducts, where hfac<sup>-</sup> is …
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Evaporative Vapor Deposition for Depositing 2D Materials
The development of a new deposition technique called evaporative vapor deposition (EVD) is reported, allowing deposition and formation of atomically-thin, large area materials on arbitrary substrates. This work focuses on the highly popular monolayer material – graphene oxide (GO). A droplet of a …
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Ionized Physical Vapor Deposition of Aluminum Oxide
Made available in DSpace on 2017-07-06T18:55:08Z (GMT). No. of bitstreams: 3 Li_Ning_MS.pdf: 51415629 bytes, checksum: c29c8d58534efcdd114931c9fc6f3d8d (MD5) Li_Ning_MS_ABS.pdf: 619486 bytes, checksum: 41ecf59db6588595b2e30243525fce36 (MD5) license.txt: 4813 bytes, checksum: …
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Diagnostics for ionized physical vapor deposition chambers
… diagnostics are needed to accurately predict the deposition profile of features on the wafer. Traditionally, the incident ion fluxes are considered to be perfectly normal to the wafer plane due to the electric field of the plasma sheath. However from simulation results the ion flux from a …
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Selective area chemical vapor deposition of graphene
… integration with other 2D materials. Chemical vapor deposition (CVD) of graphene is the most promising way by far for the synthesis of large-scale single-crystal graphene. In this dissertation, we study the low-pressure chemical vapor deposition (LPCVD) of graphene on commercial copper foils …
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Chemical vapor deposition of functionalized isobenzofuran polymers
This thesis develops a platform for deposition of polymer thin films that can be further tailored by chemical surface modification. First, we explore chemical vapor deposition of functionalized isobenzofuran films using two different functional groups: pentafluorophenolate ester and alkyne. Both …
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Chemical vapor deposition of antimicrobial polymer coatings
… and surfaces antimicrobial. Initiated chemical vapor deposition (iCVD), a solventless low-temperature process, is used to form thin films of polymers on fragile substrates. To improve research efficiency, a new combinatorial iCVD system was fabricated and used to efficiently determine the …
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Multiscale modeling strategies for chemical vapor deposition
… as a function of growth conditions in chemical vapor deposition (CVD) reactors, a model should describe multiple time and length scales. These scales include the reactor scale ([approx]0.1-1 m), the feature scale ([approx.]0.1-100 [mu]m), and the atomistic morphology evolution scale ([approx.]10 …
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Metalorganic chemical vapor deposition of metal oxides
… substrates by hot wall metalorganic chemical vapor deposition (MOCVD). Bis(cyclopentadienyl)ruthenium [Ru(C₅H₅)₂], zirconium tetramethylheptanedione [Zr(thd)₄], triphenylbismuth [Bi(C₆H₅)₃], and titanium ethoxide [Ti(C₂H₅O)₄] were used as precursors. MOCVD RuO₂ film structure was dependent on …
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The growth and characterization of III-V compound semiconductor materials by metalorganic chemical vapor deposition and laser photochemical vapor deposition
Despite the vast use of metalorganic chemical vapor deposition (MOCVD) for the growth of optical and electronic devices, it is a process for which the details of the reaction mechanisms are not well understood. Efforts aimed at gaining insight into growth-related matters will be described here and …
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Polymeric nitrogen by plasma enhanced chemical vapor deposition
… detailed study of a plasma-enhanced chemical vapor deposition (PECVD) approach to the synthesis of polymeric nitrogen. PECVD provides non-equilibrium conditions known to produce high pressure-temperature phases. Molecular nitrogen mixed with hydrogen and argon is used as the gas phase …
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Secondary Plasma Sources for Ionized Physical Vapor Deposition
… fractions to the substrate of 51 +/- 10% with a deposition rate of 847 +/- 42 A/min. are found. Without the antenna, the ionization fraction is 30 +/- 6% and the deposition rate is 815 +/- 41 A/min. This remote source is envisioned to sit six or more around a sputtering chamber, which can help …
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Kinetic optimization of titanium silicide chemical vapor deposition
… interest has arisen in fabrication by chemical vapor deposition (CVD) because of scalability problems with the salicide process (a Ti-Si solid-phase reaction) that currently defines the state-of-the-art. Furthermore, the possibility of selective CVD on Si vs SiO$\sb 2$ offers the potential to …
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Nucleation inhibition and enhancement in chemical vapor deposition
Area selective deposition (ASD) is becoming increasingly attractive as a bottom-up approach to nanomanufacturing. Most ASD processes developed so far concern selective deposition of metal on metal (i.e., not on non-metallic surfaces) or oxide on oxide (i.e., not on metallic surfaces), but …
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Environmentally focused patterning and processing of polymer thin films by initiated chemical vapor deposition (iCVD) and oxidative chemical vapor deposition (oCVD)
… in raw materials utilization. Initiated Chemical Vapor Deposition (iCVD) is a low-energy, one step, solvent-free process for producing polymeric thin films This thesis describes the deposition of a novel low-k iCVD precursor, 1,3,5,7-tetravinyltetramethylcylcotetrasiloxane (V4D4). The high degree …
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Laser-assisted metalorganic chemical vapor deposition of zinc selenide
Laser-assisted metalorganic chemical vapor deposition (LMOCVD) has been used to grow epitaxial zinc selenide at temperatures as low as 200$\sp\circ$C. The metalorganic sources, dimethylzinc (DMZ) and diethylselenide (DESe), were photodissociated with radiation from a 193 nm ArF excimer laser …
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A Simplified Model of Planetary Chemical Vapor Deposition Reactors
A simplified model for planetary chemical vapor deposition reactors is proposed and used to compute deposition species mole fraction and deposition rate in the reactor depletion zone. First, the modeling and optimization work performed in the literature is reviewed and their representative …
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