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Showing 1 to 19 of 19 for “"Titanium-Nitride (TiN)"”.

  1. An investigation of the temperature distribution induced during laser chemical vapor deposition (LCVD) of titanium nitride on titanium-aluminum-vanadium

    … temperature have been made during LCVD of titanium nitride (TiN) on Ti-6Al-4V substrates. The precursors that have been used are TiCl$\sb4,$ N$\sb2,$ and H$\sb2.$ Also, deposition has been studied as a function of the N$\sb2$:H$\sb2$ gas ratio, the TiCl$\sb4$ partial pressure, the total …

    uiuc Repository record for An investigation of the temperature distribution induced during laser chemical vapor deposition (LCVD) of titanium nitride on titanium-aluminum-vanadium (opens in a new tab)

  2. Structure and properties of titanium nitride-strengthened microlaminate metal matrix composites

    … examines the structure and properties of titanium nitride strengthened microlaminate metal matrix composites. Reactive ion plated titanium nitride (TiN) was deposited onto titanium, nickel, and aluminum foils which were subsequently hot pressed to form microlaminate composites. The TiN

    uiuc Repository record for Structure and properties of titanium nitride-strengthened microlaminate metal matrix composites (opens in a new tab)

  3. Reactive Plasma Etching of Silicon Carbide, Silicon Carbonitride, and Titanium Nitride in a Tetrafluoroethane/Oxygen Plasma

    … We will use silicon carbide (SiC), silicon carbonitride (SiCN), and titanium nitride (TiN) as our diffusion layer. Using the RF plasma and the magnetron gun with 1,1,1,2 tetrafluoroethane and oxygen as the active gases, we will obtain a reliable and reproducible method for determining the maximum …

    texas-state Repository record for Reactive Plasma Etching of Silicon Carbide, Silicon Carbonitride, and Titanium Nitride in a Tetrafluoroethane/Oxygen Plasma (opens in a new tab)

  4. Integrated optical switching using titanium nitride micro electromechanical systems

    … the ring waveguide results in loss in the propagating light within, disabling the resonance and the filtering capabilities of the ring resonator. Therefore, by actuating the MEMS bridge in and out of the waveguide's evanescent field, the filter can be toggled between the on and off states. One …

    mit Repository record for Integrated optical switching using titanium nitride micro electromechanical systems (opens in a new tab)

  5. Impedance Characterization and Modeling of Subcellular to Micro-Sized Au, Pt, TiN, and ITO Electrodes With PEDOT:PSS-Coating For Bioelectrical Interfaces

    … of biocompatible electrode materials consisting of gold (Au), platinum (Pt), indium tin oxide (ITO), and titanium nitride (TiN) coated with/without organic polymer, poly(3,4-ethylenedioxythiophene) polystyrene sulfonate (PEDOT:PSS), with electrode diameters (D) ranging from millimeter to …

    gatech Repository record for Impedance Characterization and Modeling of Subcellular to Micro-Sized Au, Pt, TiN, and ITO Electrodes With PEDOT:PSS-Coating For Bioelectrical Interfaces (opens in a new tab)

  6. Control of Microstructure and Texture in Nanocrystalline Transition -Metal Nitride Coatings by Ion Beam Assisted Deposition Method

    In this study, titanium nitride (TiN), chromium nitride (CrN) and vanadium nitride (VN) were prepared by ion-beam-assisted deposition method (IBAD). The film microstructure was observed using scanning electron microscopy (SEM). The results showed that the microstructure was controlled by homologous …

    uiuc Repository record for Control of Microstructure and Texture in Nanocrystalline Transition -Metal Nitride Coatings by Ion Beam Assisted Deposition Method (opens in a new tab)

  7. Investigation on plasma properties for deposition of titanium nitride film using reactive magnetron sputtering system

    … and industrial process especially formation of titanium nitride (TiN) films due to its high hardness, good wear resistance, low friction coeffcient and chemical stability. These TiN films have been commonly used in microelectronics and coatings area. However, formation of TiN thin flms in nano …

    uthm Repository record for Investigation on plasma properties for deposition of titanium nitride film using reactive magnetron sputtering system (opens in a new tab)

  8. In vitro feasibility testing of floating light-activated minroelectrical stimulators

    … stimulation is the mechanical stress and resulting trauma induced on the implanted electrodes by the constant movement of the interconnects. A potential way of eliminating interconnects is to use floating micro-stimulators that can be activated through optical means. As a method of energy …

    njit Repository record for In vitro feasibility testing of floating light-activated minroelectrical stimulators (opens in a new tab)

  9. Growth of titanium-nitride thin films for low-loss superconducting quantum circuits

    This is a study of the growth of titanium-nitride (TiN) by plasma assisted molecular beam epitaxy (MBE) for applications in low loss quantum circuits. Titanium nitride is a material known to have low loss at microwave frequencies which sees practical use in many emerging quantum device …

    uiuc Repository record for Growth of titanium-nitride thin films for low-loss superconducting quantum circuits (opens in a new tab)

  10. Origami-inspired nanofabrication utilizing physical and magnetic properties of in situ grown carbon nanotubes

    … in CNT growth, a new origami membrane material, titanium nitride (TiN), is introduced. This new origami membrane serves as an excellent diffusion barrier layer throughout the CNT growth process while promoting consistent nanotube growth and maintaining electrical conductivity to the CNTs. Various …

    mit Repository record for Origami-inspired nanofabrication utilizing physical and magnetic properties of in situ grown carbon nanotubes (opens in a new tab)

  11. Titanium nitride as an electrode material for high charge density applications

    … of delivering such high current densities. Titanium nitride as an electrode material and other techniques like reactive ion etching, platinization of titanium were studied in this thesis towards improving charge density of electrodes. Titanium nitride (TiN) was sputtered in a custom designed …

    njit Repository record for Titanium nitride as an electrode material for high charge density applications (opens in a new tab)

  12. Texture evolution in metal nitride (aluminum nitride, titanium nitride, hafnium nitride) thin films prepared by off-normal incidence reactive magnetron sputtering

    … of crystallographic texture in aluminum nitride (AlN), titanium nitride (TiN) and hafnium nitride (HfN) films deposited by off-normal incidence reactive magnetron sputtering at room temperature in N2/Ar mixtures. Texture measurements were performed by x-ray pole figure analysis of the …

    unh-thes Repository record for Texture evolution in metal nitride (aluminum nitride, titanium nitride, hafnium nitride) thin films prepared by off-normal incidence reactive magnetron sputtering (opens in a new tab)

  13. Development of New Cathodic Interlayers with Nano-Architectures for Lithium-Sulfur Batteries

    … A praline-like flexible interlayer consisting of titanium oxide (TiO2) nanoparticles and carbon (C) nanofiber was further prepared in-situ using an electrospinning method, which allows the chemical adsorption of polysulfides throughout a robust conductive film. A significant enhancement in …

    cambridge Repository record for Development of New Cathodic Interlayers with Nano-Architectures for Lithium-Sulfur Batteries (opens in a new tab)

  14. Investigation and development of titanium nitride solid-state potentiometric pH sensor

    … excellent stability, and extensive operating range, they have several key disadvantages. pH glass electrodes need to be stored in buffer solutions, they are fragile and have limited size and shape, making them impractical for some applications, such as being potentially used as miniature …

    edithcowan Repository record for Investigation and development of titanium nitride solid-state potentiometric pH sensor (opens in a new tab)

  15. Metal-assisted chemical etching of semiconductor nanostructures for electronic applications

    … in device applications such as light emitting diodes, solar cells, biosensors, supercapacitors, thermo-electrics, and 2.5 D and 3D transistors. The detailed research on MacEtch has been accomplished by many researchers since its discovery by Li and Bohn in 2000. This includes MacEtch using …

    uiuc Repository record for Metal-assisted chemical etching of semiconductor nanostructures for electronic applications (opens in a new tab)

  16. Development of nanostructured PVD coatings for total knee replacement joints using HIPIMS.

    The aim of this study was to develop thin film coatings for total knee replacement joints using high power impulse magnetron sputtering (HIPIMS). An industrial size four cathode magnetron sputtering system equipped with direct current (DC) and HIPIMS power supplies was used for this purpose. …

    sheffield-hallam Repository record for Development of nanostructured PVD coatings for total knee replacement joints using HIPIMS. (opens in a new tab)

  17. Study of Interactions Between Diffusion Barrier Layers and Low-k Dielectric Materials for Copper/Low-k Integration

    … that provide excellent performance in preventing the diffusion and intermixing of Cu into the adjacent dielectrics. The integration of Cu with low-k materials may decrease RC delays in signal propagation but pose additional problems because such materials are often porous and contain …

    unt Repository record for Study of Interactions Between Diffusion Barrier Layers and Low-k Dielectric Materials for Copper/Low-k Integration (opens in a new tab)

  18. Reliability Characterisation of III-Nitrides Based Devices for Technology Development

    III-nitrides based devices are considered as outstanding options for a range of extremely relevant applications. These devices can significantly improve the efficiency of high-power switching appliations. They are predicted to dominate applications in the low carbon economy. In recent years, these …

    liverpool-jm Repository record for Reliability Characterisation of III-Nitrides Based Devices for Technology Development (opens in a new tab)

  19. Characterization and modeling of dry etch processes for titanium nitride and titanium films in Cl₂/N₂ and BCl₃ plasmas

    … thermal stability and low electrical resistance. Titanium (Ti) and titanium nitride (TiN) are widely used as barriers between aluminum (Al) and silicon (Si) to prevent the destructive intermixing of these two materials. The process of patterning of the interconnect containing Ti and TiN along with …

    vt Repository record for Characterization and modeling of dry etch processes for titanium nitride and titanium films in Cl₂/N₂ and BCl₃ plasmas (opens in a new tab)