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Showing 1 to 9 of 9 for “"Titanium silicide"”.
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Kinetic optimization of titanium silicide chemical vapor deposition
Titanium disilicide (TiSi$\sb 2$) has found widespread application as a material for transistor gate/source/drain contacts. Considerable interest has arisen in fabrication by chemical vapor deposition (CVD) because of scalability problems with the salicide process (a Ti-Si solid-phase reaction) …
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Chemical kinetic studies of titanium silicide chemical vapor deposition
Item marked as restricted to the 'UIUC Users [automated]' Group (id=2) by Howard Ding (hding2@illinois.edu) on 2011-05-07T14:48:04Z Item is restricted indefinitely.
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Low energy ion beam modification of the titanium silicide (100) reaction
This research investigated the effects of the ion beam assisted deposition process on the interdiffusion and reaction of Ti thin films deposited on Si (100). The analytical techniques employed for the characterization of these thin films included transmission electron microscopy, scanning electron …
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Cobalt silicide characterization
… which leads to degraded device performances. Silicides can reduce sheet resistance on poly-silicon lines and shallow junctions. The mostly widely accepted silicide process, Titanium Silicide (TiSi2), was adopted because of its low resistivity. Major limitations of TiSi2 include an inability to …
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Characterisation of mechanically alloyed feedstock for laser-powder bed fusion: titanium silicon carbide metal matrix composite
… Herein, a metal matrix composite (MMC) with a titanium (Ti6Al4V) matrix reinforced with silicon carbide (SiC) is characterised. The research investigated an innovative and novel feedstock production process involving elements of mechanical alloying, tailored to the requirements of the layer …