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Showing 1 to 7 of 7 for “"T-gate"”.

  1. Aligned T-gate, fabrication using X-ray lithography

    Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1997.

    mit Repository record for Aligned T-gate, fabrication using X-ray lithography (opens in a new tab)

  2. Manufacturable Millimeter-Wave Gallium Arsenide MESFET Integrated Circuit Technology

    … ICs. Future plans for low-noise 0.10 $\mu$m T-gate FETs using ion-implantation and electron-beam lithography techniques are also discussed.

    uiuc Repository record for Manufacturable Millimeter-Wave Gallium Arsenide MESFET Integrated Circuit Technology (opens in a new tab)

  3. High-Speed Indium Gallium Phosphide/indium Gallium Arsenide/indium Phosphide Doped-Channel HFETs and Implanted Gallium Arsenide Enchancement/depletion-Mode MESFETs Technology With an f(T) Over 130 GHz

    … ratio. A simple low-temperature T-gate process using a novel implantation schedule for high-performance direct ion-implanted GaAs enhancement/depletion-mode MESFETs was demonstrated. The 0.12-mum gate-length D-mode MESFET shows an fT of 136 GHz and fmax of 200 GHz. With the same …

    uiuc Repository record for High-Speed Indium Gallium Phosphide/indium Gallium Arsenide/indium Phosphide Doped-Channel HFETs and Implanted Gallium Arsenide Enchancement/depletion-Mode MESFETs Technology With an f(T) Over 130 GHz (opens in a new tab)

  4. Characterization of reactive ion etching of III-V compound semiconductor materials

    … methane (CH$\sb4$) gas mixtures has been investigated. Etch rates of 800, 400 and 600 A are obtained for InP, InGaAs, and InGaAsP, respectively. Optimum processes have been developed for reliable fabrication of uniform short period gratings with smooth etched surfaces and excellent stoichiometry …

    uiuc Repository record for Characterization of reactive ion etching of III-V compound semiconductor materials (opens in a new tab)

  5. Implementing Quantum Gates With Length-3 Dynamic Graphs

    … walks have been shown to implement quantum gates, including the T gate, Hadamard gate, and the Controlled{NOT gate. Since these gates make up a universal set of quantum gates, they can implement any other arbitrary quantum gate up to an arbitrary approximation. This process, however, can be …

    creighton Repository record for Implementing Quantum Gates With Length-3 Dynamic Graphs (opens in a new tab)

  6. Modelling of advanced submicron gate InGaAs/InAIAs pHEMTS and RTD devices for very high frequency applications

    … i.e., very low breakdown voltage and high gate leakage current. These disadvantages degrade device performance, especially in Monolithic Microwave Integrated Circuit (MMIC) low noise amplifiers (LNAs). The optimisation of InAlAs/InGaAs epilayer structures through advanced bandgap …

    uthm Repository record for Modelling of advanced submicron gate InGaAs/InAIAs pHEMTS and RTD devices for very high frequency applications (opens in a new tab)