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Showing 1 to 20 of 23 for “"Substrate bias"”.
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Deposition of tantalum thin films by RF sputtering with substrate bias
… of RF sputtered tantalum thin films on different substrates, particularly aluminum and silicon, have been studied. The effect of substrate biasing on ion current and film thickness has been investigated. The study included comparison between substrate ion current of DC sputtering and RF sputtering …
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The Growth of Copper - Chromium Metastable Alloys by Bias Sputtering: Effect of Substrate Bias and Alloy Composition on Solubility and Morphology
… alloys have been successfully grown by bias rf sputtering. The effect of substrate bias and film composition on the early stages of film growth, on the film microstructure and morphology, and on the phase transformation process of the metastable films were studied using (S)TEM, SEM, AES, …
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The properties of sputtered copper oxide thin film for sensing application
… at above 8sccm oxygen flow rate. As for the substrate bias voltage, the ideal value was -40V base on the ion flux value obtained through Langmuir probe analysis. In addition, comparison on the topography, morphology, roughness and sheet resistance at various substrate bias voltages through …
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Microstructure and properties of transition metal nitride and medium entropy alloy coatings
… and elastic modulus. Further, the effect of substrate bias on the TiAlSiN coatings deposited at ~ 500°C was investigated. Variations in substrate bias had little impact on the chemical concentration of the coatings, but significantly influenced the microstructure, phase composition and …
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A study of surface roughness issues in magnetic tunnel junctions
… bottom electrode is controlled by applying an rf substrate bias during the deposition. Magnetic tunnel junction elements are fabricated by using shadow mask technique. Experimental results show that the barrier properties and the performance of the magnetic tunnel junction elements depend on the …
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Tribology and Micro-Chemistry of Sputter Deposited Composite Coatings on Honed Steel Substrates
… composite coatings on chemically honed steel substrates has been investigated. The primary wear resistant coatings (TiC) were deposited by rf sputtering using a dc substrate bias and the solid lubricant coatings (TiO(,2)) were deposited in an Ar and O(,2) mixed rf glow discharge. Chemically …
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Reactive Sputter Deposition of Lithium Phosphorus Oxynitride Thin Films, A Li Battery Solid State Electrolyte
… under varying conditions of process gas, substrate bias, and deposition temperature. To understand the variations in ionic conductivity observed, the films were extensively characterized to examine structural and compositional differences, including examination by x-ray photoelectron …
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Long and short term effects of X-rays on charge coupled devices
… and temperature. Effects associated with the bias dependence of the BCCD have also been considered, with particular regard to the effect of a negative substrate bias, and the theoretical explanation has been developed. The findings of this work have demonstrated the suitability of these …
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Robustness and Stability of Gallium Nitride Transistors in Dynamic Power Switching
… commercial GaN power HEMTs are fabricated on Si substrates up to 8 inches, allowing for a remarkable cost advantage. However, a by-product of the low-cost GaN-on-Si wafer (and conductive Si substrate) is the high voltage drop and high electric field (E-field) in the GaN buffer layers and …
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Thermodynamic and Kinetic Studies of (iii-V)(1-X)(iv(2))(x) Semiconducting Thin Films
… deposition with x up to 0.06 for V$\sb{\rm s}$ (substrate bias) = 75 V, and up to 0.17 for V$\sb{\rm s}$ = 225 V. The reaction path of metastable (GaAs)$\sb{\rm 1-x}$(Sn$\sb2$)$\sb{\rm x}$ alloys followed the sequence: (1) metastable single phase, (2) GaAs rich and $\alpha$-Sn-rich phases, (3) …
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Ion-induced stress relaxation during the growth of cubic boron nitride thin films
… by ion implantation, a complex bipolar pulsed substrate bias source was constructed. This power supply enables the growth of cBN thin films under low energy ion irradiation (up to 200 eV) and, for the first time, the simultaneous implantation of ions with an energy of up to 8 keV during high …
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Low temperature epitaxial silicon growth using electron cyclotron resonance plasma deposition
… hydrogen. By optimizing the growth pressure, substrate temperature, microwave power, substrate bias and silane to hydrogen ratio we have developed a process which provides enhanced growth rates and good uniformity at temperatures (425-575° C) significantly below those used in conventional …
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High mobility germanium MOSFETs : study of ozone surface passivation and n-type Dopant channel implants combined with ALD dielectrics
… of surface electric field for the first time. Substrate bias measurements and low temperature characterization both suggest a reduction in Dit, primarily of acceptor-like trap states near the conduction band.
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The microstructure and properties of unbalanced magnetron sputtered CrN[x] coatings.
… parameter window: a combination of a high substrate bias voltage (> -200 V) and a high partial pressure of nitrogen (a multitude of the argon partial pressure). This phase shows a strong {100} preferred crystallographic orientation and shows an excellent behaviour against corrosion and wear.
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The impact of coating architecture on the hardness, friction and wear resistance of hard and tribological nanocomposite coatings
… grain orientation.</p><p>In this research effort bias sputter deposition, co-sputtering, and magnetron sputtering-pulsed laser deposition are used to deposit and control the formation of composite coating architectures. The developed microstructures were studied by x-ray diffraction (XRD), …
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Giant Magneto-impedance Effect In Thin Film Layered Structures
… by varying respective target powers. Different substrate bias conditions were also studied. Also, NiFe films were studied by varying relative composition by variation of target powers and also by variation deposition pressure. The effect of annealing was also studied. The magnetic and electrical …
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Photo-Assisted Etching in Halogen Containing Plasmas
… bonds) caused by VUV photons irradiating the substrate. Optical Emission Spectroscopy was used to gain an insight into possible in-plasma PAE mechanisms. Emissions from Cl, Si, SiCl, and Ar were recorded as a function of power while etching p-Si in a 50%Cl2/50%Ar plasma at a pressure of 60 …
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DIAGNOSTICS AND REAL-TIME MONITORING OF PULSED LASER ABLATION
… less than the ablation threshold of solid substrate, the acoustic wave reduces gradually to zero with pulse number due to laser cleaning of surface contamination. For laser fluence above the ablation threshold, it also reduces with pulse number but to a stable waveform because of substrate …
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An investigation of thin amorphous carbon-based sputtered coatings for MEMS and micro-engineering applications
… a softening effect and thus increased nanowear. Substrate bias voltage was also a significant parameter and produced hardening and a wear reducing effect at all thicknesses tested. The use of a Cr adhesion layer produced beneficial results at 150 nm thickness, but was ineffective at 50 nm. Argon …
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Ion assisted magnetron sputtering of tantalum thin film deposition and characterization
… for RF operation along with a provision for DC biasing the substrate to accelerate inert gas ions towards the tantalum thin film during its growth process. The experiments demonstrated that the ion bombardment energy, controlled by varying the bias voltages, has a strong effect on the …
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