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Showing 1 to 1 of 1 for “"Sub-10 nm gap"”.
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Novel Thin Film Nanogap Device Fabrication And 3D Integration Enabled By Adhesion Lithography
… patterning for LAE processes. It is a self-alignment process that makes use of the characteristics of the self-assembled monolayer (SAM) on specific materials to alter their surface energy, which then allows the direct removal/peeling of other materials overlapped with the SAM-treated materials. …