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Showing 1 to 20 of 60 for “"Sputter deposition"”.
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Synthesis of silicon nanocrystal memories by sputter deposition
… (x < 2) Stapelschichten. Es wurde ein Sputterverfahren entwickelt, das die Abscheidung von SiO2 und SiOx Schichten beliebiger Zusammensetzung erlaubt. Die Bildung der Nanokristalle wurde in Abhängigkeit vom Ausheilregime und der SiOx Zusammensetzung charakterisiert, wobei unter anderem …
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Sputter deposition of aluminum nitride for applications in thin-film resonators
Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1996.
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Sputter deposition and plasma modification of tungsten alloys for nuclear fusion applications
… − 100 nm films were manufactured using magnetron sputter deposition at a variety of alloy concentrations. Tungsten alloy films are known to deposit in an undesirable A15 crystal phase. The films were heat treated at 650◦C for 1 hour, 2 hours and 4 hours to induce and investigate the phase …
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Sputter deposition and plasma modification of tungsten alloys for nuclear fusion applications
… − 100 nm films were manufactured using magnetron sputter deposition at a variety of alloy concentrations. Tungsten alloy films are known to deposit in an undesirable A15 crystal phase. The films were heat treated at 650◦C for 1 hour, 2 hours and 4 hours to induce and investigate the phase …
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Sputter deposition and characterization of metal sandwiched indium tin oxide/silicon for solar cell application
… frequency (RF) and direct current (DC) magnetron sputtering technique. The microstructural, topological, morphological, optical and electrical properties of the prepared films were investigated after undergoing post-annealing treatment in a range of 300-600oC in air. X-ray diffraction analysis of …
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Reactive Sputter Deposition of Lithium Phosphorus Oxynitride Thin Films, A Li Battery Solid State Electrolyte
… films may be prepared by many techniques, but RF sputter deposition is most frequently used and was investigated in this dissertation, in spite of its low deposition rate, because of it offers more reliable and controllable processing. This dissertation includes the methodologies of sputter …
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Optical Emission Spectroscopy during Sputter Deposition of CdTe Solar Cells and CuTe-Based Back Contacts
<p>In this dissertation sputtering processes are studied in detail through optical emission spectroscopy. In order to extract plasma parameters, experimental data and simulations were matched together. We could extract excitation temperatures, vibrational temperatures and rotational temperatures of …
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Low-temperature growth of silicon and silicon-germanium alloy by ultrahigh vacuum ion-beam sputter deposition
The use of energetic (average energy $\simeq$ 18 eV), rather than thermal, Si beams increased Si(001) epitaxial thicknesses t$\rm\sb{e}$ by up to an order of magnitude over the growth temperature range $\rm T\sb{s}=80{-}300\sp\circ$C yielding t$\rm\sb{e}$ = 10 nm-1.2 $\mu$m at a growth rate R = 0.1 …
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Mechanisms of Gallium-Arsenide Crystal Growth and Doping by Sputter Deposition: The Role of Ion-Surface Interactions
… grown on (100) GaAs substrates using a modified sputter deposition technique. Structural, chemical, and electrical analysis of the as-deposited films indicated that they were high quality, stoichiometric single crystals. Ion bombardment played an important and sometimes dominant role in …
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Optimization of the reactive magnetron sputter deposition, and studies of hydrogen diffusion in hydrogenated amorphous silicon based materials
… properties, I have chosen the reactive magnetron sputtering method for the growth of a-Si:H and its doped alloys. The advantages of this technique are the independent control of hydrogen incorporation via the pressure of H$\sb2$ injected into the plasma, and the energetic nature of the deposition …
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Role of low-energy ion/surface interactions in controlling microstructure and texture evolution during film growth
… film growth on a-SiO$\sb2$ by two directional sputtering techniques--collimated magnetron sputter deposition (CMSD) and ionized magnetron sputter deposition (IMSD)--were investigated. Both sets of films have dense columnar microstructures with (111) preferred orientation (PO). IMSD layers …
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Plasma-assisted deposition of chromium, fluorocarbon and chromium/carbon/fluorine films on glass, polymer and metal substrates
Sputter deposition of chromium (Cr), plasma polymerization of hexafluoroethane (C$\sb2$F$\sb6$), and plasma-assisted deposition of chromium/carbon/fluorine (Cr/C/F) thin films onto glass, polytetrafluoroethylene (PTFE), and low carbon, cold rolled steel substrates has been studied. Depositions were …
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The Effect of Growth Method on GaN Films and Their Interfaces with CdTe and CdS
… the complex interfaces of GaN and InGaN grown by sputter deposition and GaN grown by metal-organic chemical vapor deposition (MOCVD) with CdTe and CdS. First, the GaN and InGaN films were characterized by AFM and XRD, and it has been shown that the MOCVD samples have a very smooth surface and are …
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Growth and characterisation of multifunctional nanocomposite coatings
… developed by a two-target reactive magnetron sputter deposition and nanoparticle-assisted electro-co-deposition processes. Advanced thin-film characterisation techniques, such as scanning electron microscopy, transmission electron microscopy, X-ray diffraction, surface wettability, …
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Transparent Platinum Counter Electrode for Building Integrated Dye-sensitized Solar Cells
… (CE) has been developed based on spray deposition of Pt nanoparticles (Pt-NPs) on hot substrates. The platinum consumption hence the cost of the counter electrode was reduced over 86%, compared to conventional Pt counter electrode prepared by sputter deposition method. The prepared Pt-NP …
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Synthesis of Metal Nanowires Using Nanocracks and Dna-Templates and Their Characterization
… to form nanowires of various metals through sputter deposition or evaporation. The test-bed is compatible with commercially available TEM stages for conducting in situ nanostructural observations during annealing. In situ analyses revealed grain growth in gold and nickel nanowires, whereas …
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Nanostructural, Surface Morphological Evolution, and Physical Properties of Sodium Chloride-Structure Titanium Nitride and Titanium Cerium Nitride Layers as a Function of Composition
… at 350°C using UHV reactive magnetron sputter deposition in pure N2. The N+2 to metal ratio incident at the growing film is maintained constant at 15 while the ion energy EN+2 is varied from 14 to 45 eV. Films grown with EN+2 = 14 eV consist of equiaxed nanograins with an average size …
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Reactive DC magnetron sputtering of ultrathin superconducting niobium nitride films
DC reactive magnetron sputtering was used to deposit few-nanometer-thick films of niobium nitride for fabrication of superconducting devices. Over 1000 samples were deposited on a variety of substrates, under various chamber conditions. Sheet resistance, thickness and superconducting critical …
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Growth and characterisation of thin film superconductors on oxides, silicon and silicides
… films by inverted cylindrical magnetron sputtering and pulsed ruby laser ablation on oxides, silicon and silicides is investigated. The inverted cylindrical magnetron sputter system has been effectively used to counter the problem of negative ion re-sputtering found in sputter deposition …
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