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Showing 1 to 1 of 1 for “"Slot plane antenna plasma"”.
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Reliability study of Zr and Al incorporated hf based high-k dielectric deposited by advanced processing
… similar cyclical process with exposure to SPA Ar plasma; and (iii) As-Dep: the dielectric deposited without any intermediate step. MOSCAPs are formed with TiN metal gate and the reliability of these devices is investigated by subjecting them to a constant voltage stress in the gate injection mode. …