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Showing 1 to 20 of 164 for “"Silicon Nitride"”.

  1. Impact of silicon nitride thickness on the infrared sensitivity of silicon nitride-aluminum microcantilevers

    This thesis investigates how silicon nitride thickness impacts the performance of silicon nitride - aluminum bimaterial cantilever infrared sensors. A model predicts cantilever behavior by considering heat transfer within and from the cantilever, cantilever optical properties, cantilever bending …

    uiuc Repository record for Impact of silicon nitride thickness on the infrared sensitivity of silicon nitride-aluminum microcantilevers (opens in a new tab)

  2. Processing, characterization, and mechanical properties of beta silicon nitride whisker/silicon nitride matrix composites

    Ceramic matrix composites, consisting of $\beta$-$\rm Si\sb3N\sb4$ whisker reinforced polycrystalline $\rm Si\sb3N\sb4$, were fabricated with controlled whisker/matrix interfaces, characterized on the microstructural level, and evaluated for mechanical reliability. As-received and coated …

    uiuc Repository record for Processing, characterization, and mechanical properties of beta silicon nitride whisker/silicon nitride matrix composites (opens in a new tab)

  3. Rolling contact fatigue of silicon nitride.

    Silicon Nitride has traditionally been used as rolling contact bearing material owing to its superior performance compared to bearing steels. Its successful application as a bearing element has led to the development of Silicon Nitride in other rolling contact applications in the automotive …

    bournemouth Repository record for Rolling contact fatigue of silicon nitride. (opens in a new tab)

  4. Sol-gel preparation of silicon nitride materials

    … of interest.<br/>In this thesis, formation of silicon nitride based materials as thin films, aerogels, inverse opal films and phosphor powders have been synthesised using non-oxide sol-gel methods. For thin films formation of amorphous silicon nitride, [Si(NHMe)4] solution in tetrahydrofuran …

    soton Repository record for Sol-gel preparation of silicon nitride materials (opens in a new tab)

  5. Processing and properties of silicon nitride ceramics

    Silicon nitride, Si₃N₄, ceramics were produced using either silicon or silicon nitride powder. The silicon was reaction bonded in nitrogen atmosphere to form reaction bonded Si₃N₄,which was then sintered between 1700°C and 1800°C to form a dense Si₃N₄ ceramic. The silicon nitride powder compacts …

    cape-town Repository record for Processing and properties of silicon nitride ceramics (opens in a new tab)

  6. Mixed oxides as sintering aids for silicon nitride

    Includes bibliographical references (pages 194-202).

    colo-mines Repository record for Mixed oxides as sintering aids for silicon nitride (opens in a new tab)

  7. Defect tolerance assessment of silicon nitride in rolling contact.

    … unexplored types of surface defects on silicon nitride balls – ‘star’ type defects and ‘missing material’. The main objective of this research is to determine failure modes and the critical or tolerable defect sizes for rolling bearing applications. This is achieved by means of both …

    bournemouth Repository record for Defect tolerance assessment of silicon nitride in rolling contact. (opens in a new tab)

  8. Fracture of Hot-Pressed Silicon Nitride at Elevated Temperatures

    … and Al(,2)O(,3)-Y(,2)O(,3)-doped hot-pressed silicon nitrides were fractured between 1100(DEGREES)C and 1350(DEGREES)C in four point bend at three displacement rates. Fracture stress and critical stress intensity factor were calculated and plotted versus temperature for each displacement rate. …

    uiuc Repository record for Fracture of Hot-Pressed Silicon Nitride at Elevated Temperatures (opens in a new tab)

  9. Nondestructive Evaluation of Zirconium Phosphate Bonded Silicon Nitride Radomes

    … shock capabilities. Zirconium phosphate bonded silicon nitride (Zr-PBSN), which has a low and thermally stable dielectric constant, high rain erosion resistance and a low-cost processing method, has been developed for radome applications in advanced tactical missiles. Pressureless sintering …

    vt Repository record for Nondestructive Evaluation of Zirconium Phosphate Bonded Silicon Nitride Radomes (opens in a new tab)

  10. Nanoindentation Techniques for the Evaluation of Silicon Nitride Thin Films

    <p>Silicon nitride thin films are of interest in the biomedical engineering field due to their biocompatibility and favorable tribological properties. Evaluation and understanding of the properties of these films under diverse loading and failure conditions is a necessary prerequisite to their use …

    calpoly Repository record for Nanoindentation Techniques for the Evaluation of Silicon Nitride Thin Films (opens in a new tab)

  11. Formation of Silicon-Nitride Structures by Direct Electron-Beam Writing

    Localized deposits of silicon nitride, which are stable to at least 500(DEGREES)C, have been formed by a new technique: electron bombardment of nitrogen molecules weakly bound on a clean Si(100)-(2 X 1) surface chilled to T (TURN) 30(DEGREES)K. This process is fairly efficient; for an initial …

    uiuc Repository record for Formation of Silicon-Nitride Structures by Direct Electron-Beam Writing (opens in a new tab)

  12. Formation of Silicon Nitride Structures by Direct Electron-Beam Writing

    Localized deposits of silicon nitride, which are stable to at least 5000 C, have been formed by a new technique: electron bombardment of nitrogen molecules weakly bound on a clean Si(100)-(2 x 1) surface chilled to T ~ 30° K. This process is fairly efficient; for an initial coverage of one …

    uiuc Repository record for Formation of Silicon Nitride Structures by Direct Electron-Beam Writing (opens in a new tab)

  13. Alternative chemistries for etching of silicon dioxide and silicon nitride

    Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1997.

    mit Repository record for Alternative chemistries for etching of silicon dioxide and silicon nitride (opens in a new tab)

  14. Electrical characterization of plasma-enhanced Cvd silicon nitride dielectric on copper

    … copper as the bottom electrode, plasma enhanced silicon nitride as the dielectric, and Tantalum nitride as the top electrode. The target capacitance density is 1.5fF/mum2. The target leakage current is 1e-7A/cm2 at 3.3V at 125°C. The maximum operating voltages that the MIM is designed for is …

    unlv Repository record for Electrical characterization of plasma-enhanced Cvd silicon nitride dielectric on copper (opens in a new tab)

  15. Erosion and rolling contact wear mechanisms in silicon nitride hybrid bearings.

    … and cryogenic liquids, which lead to cavitation. Silicon nitride rolling elements with different sintering additives, properties and microstructure were experimentally studied to understand the nature of cavitation erosion. Advanced surface analysis technique was used study the erosive wear …

    bournemouth Repository record for Erosion and rolling contact wear mechanisms in silicon nitride hybrid bearings. (opens in a new tab)

  16. Failure modes of silicon nitride rolling elements with ring crack defects

    High quality silicon nitride ceramics have shown some advantages for rolling element bearing applications. In particular hybrid bearings (silicon nitride rolling elements and steel races) have the ability to withstand high loads, severe environments and high speeds. However, the difficulties of …

    bournemouth Repository record for Failure modes of silicon nitride rolling elements with ring crack defects (opens in a new tab)

  17. Charge trapping instabilities in amorphous silicon/silicon nitride thin film transistors

    Charge trapping phenomena within amorphous silicon-silicon nitride TFTs have been characterised in an extensive study. A new experimental technique has been developed and applied in conjunction with the standard measurement of threshold voltage.<br/><br/>The new technique reveals two electron …

    abertay Repository record for Charge trapping instabilities in amorphous silicon/silicon nitride thin film transistors (opens in a new tab)

  18. Sputtering fabrication of silicon nitride and silicon oxide based dichroic mirrors

    … spectrum for future solar-cell applications. Silicon oxide and silicon nitride targets were selected as materials used in the sputtering process. The sputtered multilayers and films were then characterized and analyzed using spectrophotometry. The transmission spectrum of the initial …

    mit Repository record for Sputtering fabrication of silicon nitride and silicon oxide based dichroic mirrors (opens in a new tab)

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