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Showing 1 to 2 of 2 for “"Self-sputtering"”.
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Comparison of high power impulse magnetron sputtering and modulated pulsed power sputtering for interconnect metallization
… flux. In this work, high power impulse magnetron sputtering (HiPIMS) and its derivative, modulated pulsed power (MPP) magnetron sputtering, with their claimed high ionization capability, are proposed for the application of barrier/seed layer deposition. Their plasma properties and metal ionization …
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Process property relations in reactively sputtered transition metal compounds
… compound thin films grown by reactive magnetron sputtering techniques are investigated. In the first part, the effect of energetic species, which are generated by backscattering of plasma ions at the target, on the growth and the properties of transition metal nitride films deposition by direct …