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Showing 1 to 1 of 1 for “"Self-aligned quadruple patterning (SAQP)"”.
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Design-technology co-optimization in next generation lithography
… happens along four different directions: • new patterning technique (e.g. litho-etch-litho-etch, self-aligned pattering) • new design methodology (e.g. restricted design rule, 1-D design) • new illumination system (e.g. extreme ultraviolet lithography, electronbeam, directed self-assembly) • new …