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Showing 1 to 3 of 3 for “"Self-aligned Double Patterning"”.
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Design automation algorithms for advanced lithography
… lithography have been proposed, such as multiple patterning lithography (MPL), extreme ultraviolet (EUV), electron beam lithography (EBL) and directed self-assembly (DSA). While these new technologies create enormous opportunities, they also pose great design challenges due to their unique process …
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Design-technology co-optimization in next generation lithography
… happens along four different directions: • new patterning technique (e.g. litho-etch-litho-etch, self-aligned pattering) • new design methodology (e.g. restricted design rule, 1-D design) • new illumination system (e.g. extreme ultraviolet lithography, electronbeam, directed self-assembly) • new …
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Optimization for advanced lithography
… transistors, electron beam lithography (EBL), self-aligned double patterning (SADP) lithography, directed self-assembly (DSA), extreme ultraviolet lithography (EUVL), etc. Each of the advanced lithography techniques has its own advantages over others, but also faces great challenges due to …