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Showing 1 to 1 of 1 for “"Sacrificial layer technique"”.
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In situ monitoring of reactive ion etching using a surface micromachined integrated resonant sensor
This research explores a novel in-situ technique for monitoring film thickness in the reactive etching process that incorporates a micromachined sensor. The sensor correlates film thickness with changes in resonant frequency that occurs in the micromachined platform during etching. The sensor …