Global ETD Search
Search theses and dissertations gathered from participating repositories worldwide. Every result links back to the library that holds it. No account is needed.
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Showing 1 to 12 of 12 for “"Reticle"”.
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Design and control of a self-sensing piezoelectric reticle assist device
… a device for managing the inertial loads on photoreticle of lithography scanners. Reticle slip, resulting from large inertial loads, is a factor limiting the throughput and accuracy of the lithography scanners. Our reticle-assist device completely eliminates reticle slip by carrying 96% of the …
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A spin on compressive sensing imaging : reticle-based single-pixel imaging system
… (SPI) system are analyzed using a spinning reticle often referred to as a spinning coded aperture. The cost of imaging outside of the visual spectrum using FPA detectors becomes very expensive and an affordable alternative can have major implications in the commercial and military markets …
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Reticle Stage Actuation Concepts for High Acceleration Trajectories in Next-generation Photolithography Tools
… with critical dependence on the actuation of reticle and wafer stages along precisely synchronized trajectories. Patterning throughput of such tools is limited based on the velocity and acceleration at which the stages are actuated. Modern tools require sub-nanometer accuracy of stages along …
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Magnetically levitated hysteresis motor driven linear stage for in-vacuum transportation tasks
This thesis presents a new in-vacuum reticle transportation mechanism for extreme ultraviolet (EUV) photolithography machines. In the photolithography process, the reticle is a quartz plate that contains a pattern of the integrated circuit, which needs to be transported between a storage position …
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Time dependent dielectric breakdown in novel GaN metal-insulator-semiconductor high electron mobility transistors
… we develop testing methodologies to address reticle-to-reticle variations and we estimate the lifetime of novel GaN MIS-HEMTs by performing measurements at different stress levels and temperatures in the ON and OFF-states.
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Design and control methods for high-accuracy variable reluctance actuators
… of a variable reluctance actuator for driving a reticle motion stage in photolithography scanners. The primary thesis contributions include the design and experimental demonstration of a magnetic flux controller that uses a sense coil measurement, the design and experimental demonstration of a …
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High-Contrast Observations with an Integral Field Spectrograph
… relative astrometry enabled by a pupil plane reticle grid. This tool, in combination with the spectrophotometric capability of the integral field spectrograph, reveal that the A5V star Alcor has a heretofore unknown M-dwarf companion. In my third chapter, I explore the suitability of combining …
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Effects of a combined 3-D auditory/visual cueing system and non-distributed flight reference on visual target detection using a helmet-mounted display
… Visual Only, a line emanating from the aim-sight reticle (located in the center of the subject's field of view) pointing towards the target aircraft, and (3) a Combined Audio/Visual cue, providing both cues. The subjects were asked to fly a simulated aircraft at a commanded heading and altitude …
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Design Concepts for High-Acceleration Linear Actuators for Precision Motion
… (LS) and short-stroke (SS) stages of the reticle stage in its scan direction. Such actuators need to provide the highest thrust at the deceleration and reacceleration phases when the stages turn around at the ends of the scanning trajectory. Thus, enhancing their acceleration capability …
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A roadmap for decomposition : activities, theories, and tools for system design
… application to industrial cases including a new reticle management system accommodating customer variety, software algorithms for machine control, system analysis, reuse of design rationale, and software design. The cases examined cover a wide breadth, are from different fields, and have …
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Impact of Lot Dedication on the Performance of the Fab
… at critical operations, shared resources such as reticles, rapidly changing technologies, and lot dedication for steppers and scanners for critical layers. This processing area, where wafers are exposed using scanners or steppers, typically, comprises the bottleneck workstations. Also, the numbers …