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Showing 1 to 2 of 2 for “"RF plasma discharge"”.

  1. A Novel Device for Energy Distribution Measurements in an RF Plasma Discharge

    Made available in DSpace on 2017-07-06T18:55:37Z (GMT). No. of bitstreams: 3 Nguyen_Phi_L_MS.pdf: 81580042 bytes, checksum: 3c7b14f053dfe7315d8732f2a80e9f8d (MD5) Nguyen_Phi_L_MS_ABS.pdf: 501973 bytes, checksum: 470486c7d05ab468f109e27a45f04fc8 (MD5) license.txt: 4813 bytes, checksum: …

    uiuc Repository record for A Novel Device for Energy Distribution Measurements in an RF Plasma Discharge (opens in a new tab)

  2. Reduced density hydrogenated silicon through reactive dc magnetron sputtering with secondary rf plasma discharge for EUV multilayer mirror application

    Made available in DSpace on 2019-11-26T20:49:30Z (GMT). No. of bitstreams: 2 UHLIG-THESIS-2019.pdf: 3040065 bytes, checksum: 4444cd75305422a711eb398f1ec5e75c (MD5) LICENSE.txt: 4206 bytes, checksum: 5a9d596ce58190a77714e399a794eb23 (MD5) Previous issue date: 2019-07-18

    uiuc Repository record for Reduced density hydrogenated silicon through reactive dc magnetron sputtering with secondary rf plasma discharge for EUV multilayer mirror application (opens in a new tab)