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Showing 1 to 7 of 7 for “"Positive tone"”.

  1. Materials for next-generation lithography: Crosslinked molecular resists and photo-patternable underlayers

    … This thesis will explore both negative and positive-tone crosslinked molecular resists as materials capable of sub-50nm imaging. Block copolymers have also emerged as a means of extending the usefulness of current lithographic processes. The last portion of this thesis will explore …

    gatech Repository record for Materials for next-generation lithography: Crosslinked molecular resists and photo-patternable underlayers (opens in a new tab)

  2. Novel resist materials for next generation lithography

    … derivatives have been demonstrated as negative-tone resists for electron beam lithography with impressive capability for high resolution and high plasma etching resistance, due to their carbon-rich nature. Their primary drawback of extremely poor sensitivity has been addressed by implementation …

    birmingham Repository record for Novel resist materials for next generation lithography (opens in a new tab)

  3. Electron beam lithography of molecular glass resist films prepared by physical vapor deposition

    … technique, the synthesis of applicable positive tone molecular glass resist materials was addressed in the third chapter. Finally in the fourth chapter a completely new patterning concept based on the salt formation between a base and the acid of an exposed photoacid generator was …

    bayreuth Repository record for Electron beam lithography of molecular glass resist films prepared by physical vapor deposition (opens in a new tab)

  4. Understanding molecular scale effects during photoresist processing

    … photolithography processes that are used with positive-tone, chemically amplified photoresists: film creation, exposure, post exposure bake, and development. These models are based on experimental studies that have clarified details of photoresist function including the photochemical quantum …

    texas Repository record for Understanding molecular scale effects during photoresist processing (opens in a new tab)

  5. A direct-write thick-film lithography process for multi-parameter control of tooling in continuous roll-to-roll microcontact printing

    … optimized for microcontact patterning. Positive-tone photoresists SPR 220 and AZ 9260 are examined in their process sensitivity and in their ability to provide tools for scalable [mu]CP. A fluorescent contact imaging technique is presented on the basis of fluorescent, layered composite …

    mit Repository record for A direct-write thick-film lithography process for multi-parameter control of tooling in continuous roll-to-roll microcontact printing (opens in a new tab)

  6. Democracy in the news: A comparative analysis of newspaper reporting in Hong Kong and mainland China from 2014 to 2019

    … suggests that Hong Kong media adopted a more positive tone, amplifying individual protester voices and focusing on the movements’ goals and actions. However, most reports framed the protests as expressions of dissatisfaction with the status quo, offering little in terms of actionable political …

    bournemouth Repository record for Democracy in the news: A comparative analysis of newspaper reporting in Hong Kong and mainland China from 2014 to 2019 (opens in a new tab)

  7. Strategi media relations activity dalam mencapai publisitas program Karcher Cleans Monas di Jakarta

    … media (media online, cetak dan televise), serta tone pemberitaan yang positif. Kemudian pencapaian publisitas ini juga berdampak pada Public Relations value (PR value) yang didapatkan oleh perusahaan, yaitu kurang lebih sekitar USD 1.7 M, dan hal ini merupakan bentuk investasi perusahaan yang …

    malang Repository record for Strategi media relations activity dalam mencapai publisitas program Karcher Cleans Monas di Jakarta (opens in a new tab)