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Showing 1 to 14 of 14 for “"Plasma-surface interactions"”.

  1. Scale-bridging molecular dynamics simulations of plasma-surface interactions

    Plasma processing of materials plays a vital part in electronic, aerospace, automobile, metal manufacturing and biomedical industries. Plasma-surface interactions can be divided into two categories: controlled and erosive. Controlled plasma interactions are used to pattern the surfaces of materials …

    uiuc Repository record for Scale-bridging molecular dynamics simulations of plasma-surface interactions (opens in a new tab)

  2. PLASMA-SURFACE INTERACTIONS DURING REACTIVE PLASMA PROCESSING OF HYDROCARBON FILMS

    Reactive plasma interactions with hydrocarbon-based surfaces play a critical role in future biological-plasma applications and for microelectronic device manufacture. As device dimensions get smaller and we require fine control of surfaces during plasma processing we will need to develop more …

    maryland Repository record for PLASMA-SURFACE INTERACTIONS DURING REACTIVE PLASMA PROCESSING OF HYDROCARBON FILMS (opens in a new tab)

  3. Using Machine Learning to Generate a Surrogate Model for Plasma-Surface Interactions

    Plasma-surface interactions are an important effect in laboratory plasmas, but too complicatedto be modelled directly in plasma simulations. However, plasma surface interactions can be modelled by Transport and Range of Ions in Matter (TRIM) simulations based on a binary collision approximation of …

    washington Repository record for Using Machine Learning to Generate a Surrogate Model for Plasma-Surface Interactions (opens in a new tab)

  4. Beam simulation studies of plasma-surface interactions in fluorocarbon etching of Si and SiO2

    Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 1992.

    mit Repository record for Beam simulation studies of plasma-surface interactions in fluorocarbon etching of Si and SiO2 (opens in a new tab)

  5. Study of plasma-surface kinetics and feature profile simulation of poly-silicon etching in Cl²/HBr plasma

    This work characterized the Cl2/HBr ion enhanced plasma-surface interactions with poly-silicon as a function of the gas composition, ion energy, ion incident angle and other important process parameters. A realistic inductively coupled plasma beam apparatus capable of generating ions and neutrals …

    mit Repository record for Study of plasma-surface kinetics and feature profile simulation of poly-silicon etching in Cl²/HBr plasma (opens in a new tab)

  6. A technique for implementing complex boundary configurations in industrial plasma modelling and simulation

    The use of plasma as an industrial tool has become the norm within the surface treatment industry. However, our understanding of the plasma surface interactions is still within the R&D phase. What can be done experimentally is limited due to the electromagnetic properties of plasma and the …

    dcu Repository record for A technique for implementing complex boundary configurations in industrial plasma modelling and simulation (opens in a new tab)

  7. An experimental study and modeling of Transformer-Coupled Toroidal Plasma processing of materials

    The Transformer Coupled Toroidal Plasma (TCTP) source uses a high power density plasma formed in a toroidal-shaped chamber by transformer coupling using a magnetic core. The objectives of the thesis are (1) to characterize the TCTP source, (2) to understand the kinetics and limitations of species …

    mit Repository record for An experimental study and modeling of Transformer-Coupled Toroidal Plasma processing of materials (opens in a new tab)

  8. CHAOS: A multi-GPU PIC-DSMC solver for modeling gas and plasma flows

    Numerical modeling of gas and plasma-surface interactions is critical to understanding the complex kinetic processes that dominate the extreme environments of planetary entry and in-space propulsion. However, simulations of these systems that evolve over multiple length- and time-scales is …

    uiuc Repository record for CHAOS: A multi-GPU PIC-DSMC solver for modeling gas and plasma flows (opens in a new tab)

  9. Kinetics modeling and 3-dimensional simulation of surface roughness during plasma etching

    The control of feature profiles in directional plasma etching processes is crucial as critical dimension, line-edge roughening, and other artifacts affect device performance and process yields. A profile simulator is necessary to predictively model the etching processes as well as roughness …

    mit Repository record for Kinetics modeling and 3-dimensional simulation of surface roughness during plasma etching (opens in a new tab)

  10. Etching of Silicon, Silicon Nitride, and Atomic Layer Etching of Silicon Dioxide using Inductively Coupled Plasma Beams

    … importance of this process, studies of the basic plasma chemistry and plasma-surface interactions when using these gases are largely lacking. Furthermore, fabrication of devices with feature sizes below 10 nm requires manufacturing with atomic level precision, making Atomic Layer Etching (ALE) …

    houston Repository record for Etching of Silicon, Silicon Nitride, and Atomic Layer Etching of Silicon Dioxide using Inductively Coupled Plasma Beams (opens in a new tab)

  11. Dynamic interactions between energetic D and He ions on lithium-tungsten plasma-facing interfaces

    … of highly-dense high-temperature fusion plasmas, a considerably higher demand is placed on the plasma facing components (PFCs) with an increase of fusion power production. Currently within operating experimental reactors, the PFCs need to handle only a few MW/m$^2$ of heat flux and …

    uiuc Repository record for Dynamic interactions between energetic D and He ions on lithium-tungsten plasma-facing interfaces (opens in a new tab)

  12. Coupling a Boltzmann plasma and BCA surface for the kinetic treatment of plasma-material interactions

    DSpace SAF Submission Ingestion Package generated from Vireo submission #11546 on 2017-09-29 at 11:32:22

    uiuc Repository record for Coupling a Boltzmann plasma and BCA surface for the kinetic treatment of plasma-material interactions (opens in a new tab)

  13. Multiscale numerical simulations of the magnetized plasma sheath with massively parallel electrostatic particle-in-cell code

    Understanding the physics of the plasma boundary and plasma-surface interactions is one of the key scientific challenges in fusion science and engineering. Large-scale integrated simulations and high-performance computing can provide valuable insights on the dynamic phenomena involved at the …

    uiuc Repository record for Multiscale numerical simulations of the magnetized plasma sheath with massively parallel electrostatic particle-in-cell code (opens in a new tab)

  14. Development of reduced-order models of the ion impact distribution function in magnetized plasma sheaths

    Submission original under an indefinite embargo labeled 'Open Access'. The submission was exported from vireo on 2023-09-01 without embargo terms

    uiuc Repository record for Development of reduced-order models of the ion impact distribution function in magnetized plasma sheaths (opens in a new tab)