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Search theses and dissertations gathered from participating repositories worldwide. Every result links back to the library that holds it. No account is needed.
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Showing 1 to 20 of 33 for “"Plasma-enhanced chemical vapor deposition (PECVD)"”.
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Chemical vapor deposition of polymeric films
… high environmental stability. In this project, chemical vapor deposition (CVD) and plasma enhanced chemical vapor deposition (PECVD) of carbon films with PPN structure using PTCDA as precursor were carried out under different conditions. There is only limited information in literature on the …
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The integration of InP /InGaAsP ridge waveguide structures with dielectric waveguides on silicon
… dioxide cladding (n = 1.45) were deposited via plasma-enhanced chemical vapor deposition (PECVD). The integrated InP/InGaAsP structures were fabricated using an existing novel technique for preparing very thin (on the order of 5 pm thick) substrate free rectangular structures (approximately 145 …
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Radiation response and optical characterization of carbon based thin-films prepared by saddle field plasma enhanced chemical vapor deposition
… study, the direct current (DC) saddle field Plasma Enhanced Chemical Vapor Deposition (PECVD) method was used to prepare a set of nano-crystalline diamond samples. The relation between the deposition pressure, the gases mixing ratios and the resultant film characteristics were studied. The …
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Origins and implications of intrinsic stress in hydrogenated amorphous silicon thin films
… to be understood about the relationship between deposition conditions and the resulting structural, optical, and bulk properties of the material. In this work we investigate these correlations for a-Si:H films created using plasma enhanced chemical vapor deposition (PECVD), focusing on the …
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Microfluidic Electro-osmotic Flow Pumps
… pump designs. To better understand the EOF on plasma enhanced chemical vapor deposition (PECVD) silicon dioxide, the zeta potential was investigated. PECVD oxide is amorphous and less dense than thermal silicon dioxide, which slightly changes the zeta potential. Zeta potentials were found for …
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Origami-inspired nanofabrication utilizing physical and magnetic properties of in situ grown carbon nanotubes
… the vertically-aligned variety grown through a plasma enhanced chemical vapor deposition (PECVD)-based process, are highly versatile nanostructures that can be used in a variety of nanomanufacturing applications. However, process and material compatibility issues have prevented the nanotubes …
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Fabrication of Hollow Optical Waveguides on Planar Substrates
… layers are deposited on a silicon wafer using plasma-enhanced chemical vapor deposition (PECVD) to form the bottom layers of the ARROW waveguide. A sacrificial core material is then deposited and patterned. Core materials used include aluminum, SU-8 and reflowed photoresist, each resulting in a …
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Process Evaluation and Characterization of Tungsten Nitride as a Diffusion Barrier for Copper Interconnect Technology
… (β-W2N) development has been carried out using a plasma enhanced chemical vapor deposition (PECVD) technique that utilizes tungsten hexafluoride (WF6), nitrogen (N2), hydrogen (H2), and argon (Ar). Two design of experiments (DOE) were performed to optimize the process with respect to film …
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Microfabrication and Evaluation of Planar Thin-Film Microfluidic Devices
… the processes of photolithography, thermal evaporation, plasma enhanced chemical vapor deposition (PECVD), and wet chemical etching to ultimately provide hollow-core channels. When these microcapillaries are filled with buffer and potentials are applied across them, control of the flow in the …
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Fabrication of stress controlled silicon oxide for free- standing MEMS Devices
… dioxide films have been studied as a function of deposition parameters and annealing temperatures. Films were deposited by tetraethoxysilane (TEOS) dual-frequency plasma enhanced chemical vapor deposition (PECVD) with different time interval fractions of high frequency and low frequency plasma …
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Design, fabrication, and characterization of a compact deep reactive ion etching system for MEMS processing
… isotropically etches silicon and a C₄F₈-based plasma-enhanced chemical vapor deposition (PECVD) step that passivates the sidewalls of the etched features. The rapid alternation between the RIE and PECVD steps allows highly anisotropic features to be etched in silicon. The DRIE system developed …
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Polymeric nitrogen by plasma enhanced chemical vapor deposition
… describes the first detailed study of a plasma-enhanced chemical vapor deposition (PECVD) approach to the synthesis of polymeric nitrogen. PECVD provides non-equilibrium conditions known to produce high pressure-temperature phases. Molecular nitrogen mixed with hydrogen and argon is used …
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Spectroscopic Ellipsometry Studies of Thin Film a-Si:H Solar Cell Fabrication by Multichamber Deposition in the n-i-p Substrate Configuration
… been studied by RTSE and ex-situ mapping SE. Depositions were performed by magnetron sputtering for the metal and transparent conducting oxide contacts and by plasma enhanced chemical vapor deposition (PECVD) for the semiconductor doped contacts and intrinsic absorber layers. The motivations …
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Low dielectric constant fluorocarbon films containing silicon by plasma enhanced chemical vapor deposition
… linewidth technology. The films were prepared by plasma enhanced chemical vapor deposition (PECVD) using gas precursors of tetrafluoromethane as the source of active species and disilane (5 % by volume in helium) as both an active species source and a reducing agent to control the ratio of …
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Plasma Enhanced Layer-by-layer Deposition and Nano-crystallization of Si:H films
… relatively easy to manufacture at low cost, by plasma enhanced chemical vapor deposition (PECVD), compared to single crystal Si. The crystalline volume fraction of nc-Si films needs to be well controlled to prevent light-induced degradation of the otherwise amorphous hydrogenated Si (a-Si:H). A …
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Amorphous hydrogenated boron carbide for solid-state direct-conversion thermal neutron detection
… and high stability under harsh physical and chemical environment. However, its success has been hindered by its poor and/or not well understood charge transport properties as well as fabrication challenges. This study focuses on obtaining thick and stable a-BC:H films using plasma-enhanced …
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Si-DLC coatings optimized for low wear and low friction applications.
… the coatings.A literature survey on sputtering, plasma enhanced chemical vapor deposition (PECVD) and carbon based materials with a focus on a-C:H and Si-DLC coatings is given. This survey includes a brief overview of the 60 years history of DLC coating.In the second part of the thesis, the …
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The Bulk and Interfacial Electronic and Chemical Structure of Amorphous Hydrogenated Boron Carbide
The chemical and electronic structure, as related to the surface, interface and bulk of amorphous hydrogenated boron carbide (a-BxC:Hy), is of interest in neutron detection and microelectronics. This dissertation investigates the chemical and electronic structure of semiconducting thin-film …
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Synthesis and characterization of plasma enhanced chemically vapor deposited tantalum films
A low temperature inorganic plasma-enhanced chemical vapor deposition (PECVD) process has been developed for the growth of Ta using tantalum pentachloride (TaC15) as the preferred precursor and hydrogen as the reactant gas. Ta coatings were deposited at substrate temperature of 370-400 C, reactor …
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Herstellung und Untersuchung von beidseitig passivierten kristallinen Siliziumsolarzellen
… silicon nitride layers were deposited in a plasma enhanced chemical vapor deposition (PECVD) batch reactor. With a plasma generation frequency of 440 kHz surface recombination velocities below 70 cm/s on 1 omega cm float zone silicon (FZ-Si) and below 30 cm/s on 6 omega cm Czochralski …
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