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Showing 1 to 1 of 1 for “"Plasma-Assisted Cleaning by Metastable Atomic Neutralization (PACMAN)"”.
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Removal of organic contaminants from lithographic materials
… EUV photons at 13.5 nm are easily absorbed by many species, including dust, thin-film layers, and other debris present in the path of the photons. Carrying out EUVL inside a vacuum helps reduce the amount of photon loss for illumination, however contamination in the sys- tem is unavoidable, …