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Showing 1 to 20 of 49 for “"Plasma processing"”.
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Plasma Processing of Superconducting Radio Frequency Cavities
<p>The development of plasma processing technology of superconducting radio frequency (SRF) cavities not only provides a chemical free and less expensive processing method, but also opens up the possibility for controlled modification of the inner surfaces of the cavity for better superconducting …
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Investigation of ion mass diagnostics for plasma processing
Plasma properties can be characterised with a multitude of diagnostic techniques which are as varied as the many industrial applications that employ them, from etching microchips to surface treatment and cleaning. A particular manufacturing technique may require a certain plasma characteristic at a …
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Surface Reaction Mechanisms for Plasma Processing of Semiconductors
… these issues, a reaction mechanism for plasma stripping of residual fluorocarbon polymer using oxygen-based chemistries has been developed and incorporated into the MCFPM. Stripping was less efficient from PS trenches having large pores and high interconnectivity, as compared to SS. Cu …
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Simulation of Transients and Transport in Plasma Processing Reactors
… transient phenomena (time variation of plasma properties) during pulsed operation of ICP reactors. Employing the 2D model, it was demonstrated that utilizing transients during pulsed operation, energetic negative ions can be extracted from pulsed ICPs that can aid in reducing charge …
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Self-consistent Monte Carlo simulations of plasma processing reactors
When the fractional ionization of a plasma exceeds 10$\sp{-5}- 10\sp{-4}$, electron-electron (e-e) collisions become important. These collisions cause the electron energy distribution (EED) to approach a Maxwellian distribution. Electron cyclotron resonance (ECR) reactors for etching and deposition …
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PLASMA-SURFACE INTERACTIONS DURING REACTIVE PLASMA PROCESSING OF HYDROCARBON FILMS
Reactive plasma interactions with hydrocarbon-based surfaces play a critical role in future biological-plasma applications and for microelectronic device manufacture. As device dimensions get smaller and we require fine control of surfaces during plasma processing we will need to develop more …
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Modeling of Wave Heated Discharges Used in Plasma Processing Reactors
… in 3-D. To investigate these processes, a 3-D plasma equipment model was improved to resolve 3-D components of the electric field produced by m = + 1,-1 antennas in solenoidal magnetic fields. For magnetic fields of 10--600 G, rotation of the electric field was observed downstream of the …
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Modeling of Atmospheric Pressure Plasma Processing of Gases and Surfaces
Atmospheric pressure plasma processing of PP in humid air increases the surface densities of alcohol, peroxy, acid, and carbonyl groups. However, significant amounts of O3 and NxOy are generated in the gas phase. Increasing the relative humidity results in decreased production of O3 and increased …
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Investigation of Plasma Processing of Polymers for Use in Biomedical Applications
Made available in DSpace on 2017-07-06T18:55:36Z (GMT). No. of bitstreams: 3 Neumann_Martin_J_MS.pdf: 69019315 bytes, checksum: 1e185629283e6c31ad3db6476865fcfe (MD5) Neumann_Martin_J_MS_ABS.pdf: 681992 bytes, checksum: cc373d626de2e697436763883cc211d4 (MD5) license.txt: 4813 bytes, checksum: …
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Modeling the non-transferred arc plasma torch and plume for plasma processing
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1992.
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Theoretical study of nanoparticle formation in thermal plasma processing Nucleation, coagulation and aggregation
… in radio frequency (RF) inductively coupled plasma (ICP) reactors. The purpose is to further investigate the influence of process parameters on the final size and morphology of produced particles. The proposed model involves the calculation of flow and temperature fields of the plasma gas. …
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An experimental study and modeling of Transformer-Coupled Toroidal Plasma processing of materials
The Transformer Coupled Toroidal Plasma (TCTP) source uses a high power density plasma formed in a toroidal-shaped chamber by transformer coupling using a magnetic core. The objectives of the thesis are (1) to characterize the TCTP source, (2) to understand the kinetics and limitations of species …
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Controlling Activation Energy to Wafers and Walls in Plasma Processing Reactors for Microelectronics Fabrication
Wafer-to-wafer reproducibility during plasma etching presents another challenge. The use of low-pressure, high-density discharges results in increasing buildup of etch products in the plasma reactor resulting in increased interactions of etch products with wafer and non-wafer surfaces, alike. …
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Particles in Plasma Processing Reactors: Modeling Nucleation, Transport, and Interparticle Effects to Reduce Wafer Contamination
Particle transport is also affected by Coulomb interactions between particles. Experimental observations showed that in trapping sites particles form clouds and move collectively. We numerically investigated Coulomb interactions between particles. In rf discharges, ordered systems (Coulomb liquids …
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Langmuir Probe Investigations of Helicon Wave Discharges in Three-Dimensions of a Commercial-Scale Plasma Processing Reactor
Made available in DSpace on 2017-07-06T18:55:40Z (GMT). No. of bitstreams: 3 Norman_Jeffrey_E_MS.pdf: 131280649 bytes, checksum: 8855837adc5e4a5499477d831ae9054d (MD5) Norman_Jeffrey_E_MS_ABS.pdf: 587265 bytes, checksum: 169d41c371af9d5cccc4c7791a7b01b3 (MD5) license.txt: 4813 bytes, checksum: …
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Intensification of Micro-Plasma Bubble Processing for N-Fixation and its Potential Application
… the intensification of non-thermal micro-plasma bubble processing for nitrogen fixation and reviewed its application both on Earth and in space. The study was carried out by performing five main tasks, these being: (1) air/N2 plasma processing in batch water/recycling water with/without …
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Investigation of an electron-beam sustained discharge in helium
… where radial ambipolar diffusion is the dominant plasma loss mechanism. This investigation is made in support of a continuing, technology-driven program to apply the unique attributes of the EBSD to plasma processing applications in the growth and etching of thin films.
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Extraordinary Temperature Amplification in Ion-Stimulated Surface Diffusion
… specific rate processes in application such as plasma processing or ion beam assist deposition.
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Modeling of generation and transport of particles in low pressure glow discharges and contamination of wafers
… are problematic in low pressure ($<$1 Torr) plasma processing (etching, deposition) discharges because they can contaminate the product and can perturb electron transport. The role of negative ions in the formation of large clusters, the precursors to particles, in low pressure plasmas is …
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