Global ETD Search
Search theses and dissertations gathered from participating repositories worldwide. Every result links back to the library that holds it. No account is needed.
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Showing 1 to 16 of 16 for “"Plasma deposition"”.
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Low temperature epitaxial silicon growth using electron cyclotron resonance plasma deposition
… region, new processes for epitaxial silicon deposition will be needed. Another application for a low temperature growth process is the fabrication of solar cells on inexpensive metallurgical grade silicon wafers. Impurity diffusion from the wafer during conventional epitaxial silicon growth …
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Decoration of graphene sheets with metal and metal oxide nanostructures by low-pressure plasma deposition
… the experimental study results about Nb2O5 deposition onto graphite nanoplatelets (GNPs) by the variation of the deposition process parameters. The structural, chemical and electronic properties of the decorated GNPs with Nb2O5 layers were studied. It was found that with deposition of Nb2O5 …
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Enhanced surface functionality via plasma modification and plasma deposition techniques to create more biologically relevant materials
… wet chemistry techniques utilize thin film depositions to functionalize nanomaterials with oxygen and nitrogen containing functional groups, such as -OH and -NHx. These functional groups can serve to create surfaces that are amenable to cell adhesion or can act as reactive groups for further …
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A real-time study of hydrogenated amorphous silicon, microcrystalline silicon, and amorphous silicon carbide growth by optically enhanced infrared reflectance spectroscopy
… control and the fundamentals of crystal growth, plasma deposition, and etching. These applications are illustrated in the thesis by studying the deposition of hydrogenated amorphous silicon (a-Si:H), microcrystalline silicon ($\mu$c-Si:H), and hydrogenated amorphous silicon carbide $\rm …
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Micro-patterned plasma and ultra-violet ozone modification of polymer surfaces.
… and Nunclon TM polystyrene (PS) dishes by; (i) plasma deposition/modification of n-Hexane, isopropyl alcohol (IPA) and acetone, and (ii) an Ultra-Violet/Ozone (UV/Ozone) oxidation treatment have been investigated as methods of influencing cell attachment behaviour. In particular, the effects of …
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New immobilized antimicrobial polyethylenimines : synthesis and properties
… PEls were replaced with a novel aerosol-assisted plasma deposition procedure. N,N-hexyl,methyl-polyethylenimines were directly plasma-coated onto a glass surface. The resulting material was thoroughly characterized and demonstrated to be robust, scalable, bactericidal against Escherichia cofi, and …
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Liquid repellent surfaces
… have certain disadvantages, however employing plasma technology may provide a route for many novel "multi-functional effects" fabrics such as repellency against toxic chemical agents. In order to produce repellent coatings the surface must have a low surface energy. To obtain this, inert …
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Exploring approaches to functional surface modifications using an atmospheric plasma jet printer
Atmospheric plasma jet printing is an exciting technology which uses plasma generated under atmospheric conditions to excite, ionize, and induce chemical interactions between the plasma and materials. The aim of this work is to use an atmospheric plasma jet printer to create highly functional, …
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Towards a universal ultra-thin fluorinated diamond-like carbon coating for nanoimprint lithography imprinters
… imprinter upon withdrawal of the imprinter. The plasma deposition of a layer of fluorinated diamond-like carbon (F-DLC) has proven to be a successful anti-adhesion layer but in the past has required an entire diamond-like carbon (DLC) substrate. The requirement that the imprinter be made of DLC …
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Fabrication of stress controlled silicon oxide for free- standing MEMS Devices
… dioxide films have been studied as a function of deposition parameters and annealing temperatures. Films were deposited by tetraethoxysilane (TEOS) dual-frequency plasma enhanced chemical vapor deposition (PECVD) with different time interval fractions of high frequency and low frequency plasma …
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Plasma processes in pulsar environments
The aim of this thesis is to study coherent plasma effects and collective plasma processes in pulsar environments. Pulsars are one of the most enigmatic objects in the universe. Formed in supernova explosions, pulsars are rapidly rotating neutron stars identified by their periodically pulsed …
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Optical spectroscopy and langmuir probe diagnostics of microwave plasma in synthesis of graphene-based nanomaterials
… and electrical properties. As roll-to-roll plasma deposition systems begin to provide means for large scale production of these nanodevices, a detailed understanding of the environment responsible for their synthesis is imperative in order to more accurately design and control the growth of …
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MATRIX-ASSISTED LASER DESORPTION/IONIZATION (MALDI) TARGET MODIFICATION FOR ENHANCED PROTEOMICS ANALYSIS AND PLASMA POLYMER CHARACTERIZATION BY MALDI MASS SPECTROMETRY
… MALDI target, produced via radio frequency (rf) plasma deposited ethylenediamine (EDA), for on-target separation of complex protein mixtures. The third section develops a new approach for characterization of rf plasma-deposited bulk polymers by using MALDI MS. Previous studies in our group have …
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Dielectric materials by Atomic Layer Deposition for microelectronic applications
The Atomic Layer Deposition (ALD) is an innovative technique to deposit thin film materials for several application fields. The rapid affirmation of the ALD process is related to the peculiarities of the deposition mechanism. In particular, because of the self-limiting principle and of the …
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Feature profile evolution during the high density plasma etching of polysilicon
… manufacturing of modem integrated circuits - the plasma etching of thin polysilicon films used to form the metaloxide- semiconductor transistor gate. The etching of very small features (-0.25 jim) in the -2500 A thick films, performed at low operating pressures (-10 mTorr), must be accompanied …
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Ανάπτυξη λεπτών υμενίων για χρήση στην ηλεκτροχημική ενίσχυση της κατάλυσης
Στην παρούσα διατριβή μελετήθηκε χρήση λεπτών καταλυτικών ηλεκτροδίων Pt/YSZ και Pt/TiO2/YSZ στην έκταση του φαινομένου της ηλεκτροχημικής ενίσχυσης, χρησιμοποιώντας την πρότυπη αντίδραση οξείδωσης αιθυλενίου, σε οξειδωτικές συνθήκες (μεταξύ 280oC και 375oC) σε αντιδραστήρα μονής πελέτας. Βρέθηκε …