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Showing 1 to 11 of 11 for “"Plasma cleaning"”.

  1. Hydrogen surface wave plasma cleaning of the EUV collector

    … EUV light is generated by a laser-produced plasma as opposed to an excimer laser, bringing new challenges that must be overcome for the technology to be viable. One such challenge is the build-up of debris in the EUV source on the main optic (called the collector), reducing reflectivity and …

    uiuc Repository record for Hydrogen surface wave plasma cleaning of the EUV collector (opens in a new tab)

  2. Experiments towards mitigation of motional heating in trapped ion quantum information processing

    … two-qubit gates. It has been demonstrated that cleaning a gold trap chip via ion milling reduces the heating rate by two orders of magnitude [1]. However, it remains unclear why ion milling causes a much more dramatic improvement than similar cleaning techniques such as plasma cleaning, which …

    mit Repository record for Experiments towards mitigation of motional heating in trapped ion quantum information processing (opens in a new tab)

  3. Design and qualification of a robust polyurethane based conformal coating process for sodimms

    … include board wash, ionograph test, masking, plasma cleaning, conformal coating spray, and cure. The board wash sub-process was qualified using three different temperature and time durations as inputs.</p> <p>When examined under a microscope, white residue was observed for lower temperature …

    binghamton Repository record for Design and qualification of a robust polyurethane based conformal coating process for sodimms (opens in a new tab)

  4. Characterization of Microwave Discharge Plasmas for Surface Processing

    … two types of microwave (MW) discharge plasmas: a supersonic flowing argon MW discharge maintained in a cylindrical quartz cavity at frequency ƒ = 2.45 GHz and a pulse repetitive MW discharge in air at ƒ = 9.5 GHz. Low temperature MW discharges have been proven to posses attractive …

    odu Repository record for Characterization of Microwave Discharge Plasmas for Surface Processing (opens in a new tab)

  5. Substrate cleaning using a remote hydrogen rf-plasma

    … In this work, low temperature remote rf-hydrogen plasma cleaning of II-VI and silicon semiconductor surfaces was investigated as a preparation for subsequent deposition in molecular beam and gas source molecular beam epitaxy environments. The plasma was characterized using mass spectrometric …

    wvu Repository record for Substrate cleaning using a remote hydrogen rf-plasma (opens in a new tab)

  6. Surface wetting methods compatible with solid SERS substrates

    … (2) addition of surfactants; (3) mild oxygen plasma cleaning; and (4) hydrophilic monolayers. The first two methods modify the solvent, and the last two modify the sensor surface. The general theoretical principles of surface wetting, as well as specific principles for each technique are …

    uiuc Repository record for Surface wetting methods compatible with solid SERS substrates (opens in a new tab)

  7. IN SITU PLASMA REMOVAL OF SURFACE CONTAMINANTS FROM ION TRAP ELECTRODES

    … construction and implementation of an in situ plasma discharge designed to remove surface contaminants from electrodes in an ion trapping experimental system is presented with results. In recent years, many advances have been made in using ion traps for quantum information processing. All of …

    unm Repository record for IN SITU PLASMA REMOVAL OF SURFACE CONTAMINANTS FROM ION TRAP ELECTRODES (opens in a new tab)

  8. Molecular Sensing using Surface-Sensitised Plasmonic Nanogaps

    … Pristine nanogaps are achieved through oxygen plasma cleaning, which removes all ligands, analytes and contaminants and oxidises the top gold atomic layers, followed by regeneration via reintroduction of a scaffold molecule and chemical reduction of the gold surface. The high signal enhancement …

    cambridge Repository record for Molecular Sensing using Surface-Sensitised Plasmonic Nanogaps (opens in a new tab)

  9. Processing and Characterization of Device Solder Interconnection and Module Attachment for Power Electronics Modules

    … in the case of polyimide passivated devices, plasma cleaning introduced a few carbon constituents on the surface, which was not observed in the case of Si<sub>3</sub>N<sub>4</sub> passivated devices. X-Ray Photoelectron Spectroscopy (XPS) Spectra showed evidence of possible carbon …

    vt Repository record for Processing and Characterization of Device Solder Interconnection and Module Attachment for Power Electronics Modules (opens in a new tab)

  10. Improvement of carbon nanotube-based field-effect transistors by cleaning and passivation

    … introduction and statistical assessment of two cleaning processes: a) wet chemical removal of surfactant residues (sodium dodecylsulfate) from CNTs, integrated using the dielectrophoretic approach, by investigation and comparison of four procedures (de-ionized water, HNO3, oDCB, Ethanol); b) the …

    qucosa-diss