Global ETD Search
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Showing 1 to 1 of 1 for “"Plamsa"”.
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Surface cleaning of optics by plasma (scope) with atomic hydrogen
A major obstacle in the implementation of extreme ultraviolet (EUV) light photolithography in production tools is the accumulation of fuel debris on the collector optics near the pinch region. Specifically, removal of deposited tin from the source onto the collector optics is needed to improve the …