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Showing 1 to 13 of 13 for “"Physical Vapor Deposition (PVD)"”.
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Electrochemical Investigation of Thin Nickel, Copper and Silver Films Interfaced with Yttria-Stabilized Zirconia
… in the lab and films deposited onto them using evaporative physical vapor deposition (PVD). The critical thickness of copper, silver and nickel thin films were foundusing in-situ resistance measurements. Following this, 50 and 100 nm copper and nickel films were studied using solid electrolyte …
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Deposition and Characterization of Ceramic Thin Films and a New Experimental Approach to Evaluate the Mechanical Integrity of Film/Substrate Interfacial Layers
… designed and constructed ultra-high-vacuum (UHV) vapor phase deposition system was used for the preparation of ceramic thin films through low-pressure high-density plasma assisted physical vapor deposition (PVD) methods. Deposited thin films were characterized by X-ray photoelectron spectroscopy …
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Corrosion studies on alpha tantalum and beta tantalum coated steel
Tantalum coating by sputtering, one form of physical vapor deposition (PVD), has been investigated as a replacement for chromium coatings on gun bores to protect them from erosion and corrosion due to its high ductility and high corrosion resistance in aggressive environments. When deposited as a …
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Tribological and structural properties of titanium nitride and titanium aluminum nitride coatings deposited with modulated pulsed power magnetron sputtering
… to offer unique plasma characteristics in the physical vapor deposition (PVD) process. High power pulses lead to a high degree of ionization compared to traditional direct-current magnetron sputtering (DCMS) and pulsed magnetron sputtering (PMS). Such a high degree of ionization was previously …
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Developing cuprous oxide thin film characterization techniques to illuminate efficiency-limiting mechanisms in photovoltaic applications
… method for Cu₂O thin films fabricated through a physical vapor deposition (PVD) process known as reactive direct-current magnetron sputtering. This both provides a platform for material analysis and an opportunity to adapt a typically high-throughput manufacturing method to make high quality thin …
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Investigation of Spinel Ferrite Thin Films for Spintronics Applications
… substrates using the pulsed laser deposition method. Typically, spinel ferrite thin films such as NiFe₂O₄ (NFO), CoFe₂O₄ (CFO), and Fe₃O₄ (FFO), deposited by both physical vapor deposition (PVD) and chemical vapor deposition (CVD) techniques suffer from several structural defects …
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Linear magnetron high deposition rate magnet pack for high power impulse magnetron sputtering
… method that has proven to be a promising ionized physical vapor deposition (PVD) technique, with industrial implementation hindered by low deposition rates. HiPIMS applies high voltages and high currents at low duty cycles to the sputtering target in order to achieve very high power densities, …
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Design and fabrication of asymmetric nanopores using pulsed PECVD
… size is then reduced to the desired level by deposition of material using pulsed plasma enhanced chemical vapor deposition (PECVD). Pulsed PECVD has been developed as a high throughput alternative to atomic layer deposition (ALD) to deliver self-limiting growth of thin films. The goal of this …
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PVD COATING TREATMENT TOWARDS A SUSTAINABLE AND ECO-FRIENDLY MANUFACTURING SYSTEM
… while reducing waste and energy consumption. Physical Vapor Deposition (PVD) offers an eco-friendly approach, and in recent years high entropy alloys (HEAs) have emerged as promising candidates for protective coatings due to their exceptional mechanical and corrosion-resistant properties. …
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Durability and Damage Analysis of Hybrid Multiscale Composites
… surface was performed with a combination of physical vapor deposition (PVD) and hydrothermal growth techniques. Various configurations of composites were fabricated to study the effects of altering the topology of the nanorods and functionalizing the fiber surface with polydopamine. …
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Development of Molecular Glasses for Solvent-Free Photolithography utilizing Combinatorial Vapor Deposition
… weight, amorphous, photosensitive resists by physical vapor deposition (PVD), their subsequent UV exposure through a mask and their development to produce features in the micro- and nanometer range. In the frame of the thesis towards a solvent-free lithography, the combinatorial PVD techniques …
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Ultra-thin boron nitride films by pulsed laser deposition: Plasma diagnostics, synthesis, and device transport
… describes, for the first time, a pulsed laser deposition (PLD) technique for growth of large area, stoichiometric ultra-thin hexagonal and amorphous boron nitride for next generation 2D material electronics. The growth of boron nitride, in this case, is driven by the high kinetic energies and …
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Electron beam lithography of molecular glass resist films prepared by physical vapor deposition
… sizes. In this thesis electron beam lithography, physical vapor deposition as alternative resist preparation technique and the materials development for this film preparation technique are covered. In the first chapter of this thesis the characterization of the utilized electron beam exposure tool …