Global ETD Search
Search theses and dissertations gathered from participating repositories worldwide. Every result links back to the library that holds it. No account is needed.
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Showing 1 to 18 of 18 for “"Photoresists"”.
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Novel Inorganic Photoresists for Three-Dimensional Microfabrication
Inorganic photoresists that can be directly patterned in three dimensions via both 3D laser direct writing and 3D interference lithography based fabrication approaches are attractive materials for the fabrication of complex microfluidic and micro-optical components such as chaotic mixing elements …
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Functionalization of Surfaces Using Photolithography and Other Techniques
… coatings investigated are in the form of photoresists that are used to create substrates for laser ablation. Adjusting the composition of the photoresists leads to the formation of unique structures during this laser ablation. Another application of photoresists that was studied is the …
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Novel Applications Of Fluoropolymers In Solution-Processed Electronics
… with otherwise incompatible commercial (organic) photoresists, via roll-to-roll compatible inkjet printing and, finally, for high resolution studies with electron beam lithography.
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Materials for next-generation lithography: Crosslinked molecular resists and photo-patternable underlayers
… in order to be realized. In particular, new photoresists will need to be developed that can be patterned at the small feature sizes expected to be used with these new techniques. This thesis will explore both negative and positive-tone crosslinked molecular resists as materials capable of …
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Development of Molecular Glasses for Solvent-Free Photolithography utilizing Combinatorial Vapor Deposition
… two types of low molecular weight, negative tone photoresists were investigated: 1.) Research was carried out on molecular glass photoresists which consist of several components. One of these components, a photoacid generator (PAG), generates acid molecules when exposed to suitable wavelengths. In …
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Understanding molecular scale effects during photoresist processing
… used with positive-tone, chemically amplified photoresists: film creation, exposure, post exposure bake, and development. These models are based on experimental studies that have clarified details of photoresist function including the photochemical quantum efficiency of photoresist exposure, …
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A direct-write thick-film lithography process for multi-parameter control of tooling in continuous roll-to-roll microcontact printing
… for microcontact patterning. Positive-tone photoresists SPR 220 and AZ 9260 are examined in their process sensitivity and in their ability to provide tools for scalable [mu]CP. A fluorescent contact imaging technique is presented on the basis of fluorescent, layered composite PDMS image …
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Polymers for Next Generation Lithography
… to be the promising materials as positive photoresists and can be studied for further evaluation of lithographic properties.
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Design and development of stimuli-responsive materials: pH sensitive polymersomes and poly(olefin sulfone)s
… development in areas such as encapsulation, photoresists, sensors, self-healing materials, drug delivery, and transient electronic devices. A variety of chemical triggers can be employed to stimulate materials, for this work the focus has been on pH-responsive materials. Materials which can …
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Photoresist modeling for 365 nm and 257 nm laser photomask lithography and multi-analyte biosensors indexed through shape recognition
… optical, kinetic and dissolution models of photoresists at 257 nm. Diazonaphthoquinone-novolak resist profiles have been simulated as a function of photoactive compound concentration to determine the lithographic limits of these materials. Furthermore, new photoactive compounds based on …
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Micro- and nano-soft lithography for the fabrication of photonic devices
… have been used to pattern organic molecules, photoresists, and conductive inks to create optically active structures and devices. A series of light emitting polymers (LEPs), blended with a photo-curable host system, have been integrated as colour converters with an array of matrix-addressable …
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Electrokinetic characteristics of particulate/liquid interfaces and their importance in contamination from semiconductor process liquids
Particulate contamination during wafer processing is a major concern in the microelectronics industry. The impurities may be generated from holding tanks, shipping containers, filter membranes and photolithographic materials, and hence may be organic and inorganic in nature. In liquids, these …
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THE USE OF PECVD SILICON OXYNITRIDE THIN-FILMS IN MICROELECTRONICS MANUFACTURING
… the effects of substrate reflection on the photoresists and achieve a high CD (Critical Dimension) controllability, a high performance Bottom Anti-Reflective Coating (BARC) is necessary for sub-0.25-llm optical lithography. In this study, a novel bottom antireflective method is described to …
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Ionic liquid ion source emitter arrays fabricated on bulk porous substrates for spacecraft propulsion
… damaging the internal pore structure. Dry film photoresists have been identified as a suitable alternative to spin on techniques for porous materials and have been applied within an electrochemical etching process. A two step process for forming arrays of ILIS has been motivated using numerical …
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Sacrificial polymers for rapid manufacturing of bioinspired vascular materials
… templates (metal wires, fugitive inks, photoresists) embedded in a host matrix to leave hollow conduits ranging from microns to meters in length. Most sacrificial materials cannot be easily templated into complex interconnected architectures or are unable to withstand thermomechanical …