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Showing 1 to 1 of 1 for “"Photo-assisted etching"”.
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Photo-Assisted Etching in Halogen Containing Plasmas
Plasma etching is indispensable in microelectronics manufacturing, due to its ability to precisely pattern feature with lateral dimensions of <10 nm. To advance this capability to etch layers with atomic fidelity, while also achieving ultra-high material selectivity, low ion energies (10s eV) are …