Global ETD Search

Search theses and dissertations gathered from participating repositories worldwide. Every result links back to the library that holds it. No account is needed.

Results

Showing 1 to 1 of 1 for “"Photo-assisted etching"”.

  1. Photo-Assisted Etching in Halogen Containing Plasmas

    Plasma etching is indispensable in microelectronics manufacturing, due to its ability to precisely pattern feature with lateral dimensions of <10 nm. To advance this capability to etch layers with atomic fidelity, while also achieving ultra-high material selectivity, low ion energies (10s eV) are …

    houston Repository record for Photo-Assisted Etching in Halogen Containing Plasmas (opens in a new tab)