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Showing 1 to 20 of 33 for “"Optical lithography"”.

  1. Absorbance modulation optical lithography

    … thesis, the concept of absorbance-modulation optical lithography (AMOL) is described, and the feasibility experimentally verified. AMOL is an implementation of nodal lithography, which is not bounded by the diffraction limit of incident lights. Experimental results showed promising capability …

    mit Repository record for Absorbance modulation optical lithography (opens in a new tab)

  2. Laser assisted nano-optics processing in optical data storage

    Optical lithography techniques have many advantages over other lithography methods although its resolution is limited by optical diffraction. Two optical lithography techniques, microlens array laser patterning and near-field scanning optical lithography, are presented to show their capabilities in …

    nus Repository record for Laser assisted nano-optics processing in optical data storage (opens in a new tab)

  3. Development of soft lithography based non-planar and 3-D photo-patterning techniques

    The fusion of soft lithography fabrication processes and optical lithography has been demonstrated in the literature. The focus of this thesis is on the adaptation of soft lithography protocols and further understanding of the materials chemistry of PDMS that allows for fabrication of soft optical

    uiuc Repository record for Development of soft lithography based non-planar and 3-D photo-patterning techniques (opens in a new tab)

  4. High-Q superconducting coplanar waveguide resonators for integration into molecule ion traps

    … waveguides in niobium on R-plane sapphire using optical lithography. Resist was patterned on the niobium using optical lithography, developed, then reactive-ion etched to transfer the pattern into the niobium. The resonators were cooled and tested in a cryogenic probe station and characterized …

    mit Repository record for High-Q superconducting coplanar waveguide resonators for integration into molecule ion traps (opens in a new tab)

  5. Design of superconducting transmission line integrated surface-electrode ion-traps

    … microwave coplanar waveguides using direct-write optical lithography and a niobium on sapphire process. We then tested these traps in a closed cycle cryostat and used 28 mW of microwave power to excite rotational transitions of trapped strontium chloride molecular ions. We expected that driving …

    mit Repository record for Design of superconducting transmission line integrated surface-electrode ion-traps (opens in a new tab)

  6. Fabrication and performance of broad-area high power narrow linewidth semiconductor laser diodes

    … Laboratory cleanroom using standard i-line optical lithography. Alternative lithography techniques are proposed without reliance on small feature definitions by electron-beam lithography. The buried grating lasers are characterized in terms of threshold current, emission wavelength, and …

    uiuc Repository record for Fabrication and performance of broad-area high power narrow linewidth semiconductor laser diodes (opens in a new tab)

  7. Nodal photolithography : lithography via far-field optical nodes in the resist

    … - to surmounting the diffraction limitation of optical lithography. This approach uses farfield optical nodes to orchestrate reversible, saturable optical transitions in certain photoresist compounds. After addressing prior work in resolution enhancement via optical nodes (for metastable atom …

    mit Repository record for Nodal photolithography : lithography via far-field optical nodes in the resist (opens in a new tab)

  8. Nano-electro-mechanical systems fabricated by tip-based nanofabrication

    … nanopatterns deposited can serve together with optical lithography patterned mask and transfer both micropatterns defined by optical lithography and nanopatterns defined by the heated AFM tip to silicon. After solving the two critical challenges, we demonstrated various types of silicon NEMS …

    uiuc Repository record for Nano-electro-mechanical systems fabricated by tip-based nanofabrication (opens in a new tab)

  9. Design and fabrication of electromagnetic micro-relays using the UV-LIGA technique

    … the device required significant advances in the optical lithography of SU-8 negative photoresist. Research proved that aspect-ratios up to 40:1 in isolated open field structures of thickness between 1 and 1.5 mm can be obtained a standard broadband UV source. The principal factor in this …

    lsu-thes Repository record for Design and fabrication of electromagnetic micro-relays using the UV-LIGA technique (opens in a new tab)

  10. Design and prototype of an automated system for commercially viable production using micro contact printing

    … extensive literature review of the suite of soft lithography techniques - Near Field Soft Optical Lithography, Replica Molding and Micro contact printing - focused on the critical factors for taking these techniques from research facilities to commercial manufacturing facilities. Micro Contact …

    mit Repository record for Design and prototype of an automated system for commercially viable production using micro contact printing (opens in a new tab)

  11. High-Speed and High-Sensitivity Metal-Semiconductor-Metal Photodetectors for Optoelectronic Integrated Circuit Applications

    … $\mu$m, to be obtained with the use of simple optical lithography tools. MSMPDs using an InGaAs absorption layer, employing a conventional layout, and utilizing transparent electrode materials composed of combinations of $\rm In\sb2O\sb3,$ CdO, and SnO$\sb2$ achieved responsivities of up to …

    uiuc Repository record for High-Speed and High-Sensitivity Metal-Semiconductor-Metal Photodetectors for Optoelectronic Integrated Circuit Applications (opens in a new tab)

  12. THE USE OF PECVD SILICON OXYNITRIDE THIN-FILMS IN MICROELECTRONICS MANUFACTURING

    … substrates becomes intolerable in sub-0.25-llm optical lithography by using KrF excimer laser stepper. Linewidth variation and notching are commonly observed during microlithographic masking. Consequently, unacceptable critical dimension control, micro trenches and poor electrical …

    nus Repository record for THE USE OF PECVD SILICON OXYNITRIDE THIN-FILMS IN MICROELECTRONICS MANUFACTURING (opens in a new tab)

  13. A study of the DRAM industry

    … to horizontal ecosystem. Also, the shrinkage of optical lithography, the main technical issue in semiconductor industry, is predicted to reach the uppermost limit. In this sense, Samsung Electronics as a DRAM provider should analyze and evaluate its current position in the DRAM market and the IT …

    mit Repository record for A study of the DRAM industry (opens in a new tab)

  14. Templated self-assembly of siloxane block copolymers for nanofabrication

    … pursued for applications in below sub-30 nm nanolithography. BCP selfassembly processing is scalable and low cost, and is well-suited for integration with existing semiconductor fabrication techniques. The two critical issues are how to obtain reliable long-range ordering of features with minimum …

    mit Repository record for Templated self-assembly of siloxane block copolymers for nanofabrication (opens in a new tab)

  15. Design and fabrication of nanostructures for thermal conductivity measurements and picosecond acoustics

    … coefficient and electrical conductivity. E-beam lithography and optical lithography with oxygen plasma etching are used to pattern sub-micron patterning and TMAH wet etching and XeF2 etching are used to release the structures to free standing. Last, fabrication of metallic gratings is presented …

    uiuc Repository record for Design and fabrication of nanostructures for thermal conductivity measurements and picosecond acoustics (opens in a new tab)

  16. Feature scaling of large, ballasted, field emission arrays

    … and had a pitch of 1 m that were patterned using optical lithography. These devices demonstrated excellent current saturation, with output conductances lower than 10??11 S. In addition, a fabrication process for building nano-sharp emitters on these high aspect ratio pillars was developed. Using …

    mit Repository record for Feature scaling of large, ballasted, field emission arrays (opens in a new tab)

  17. A finite element study of the mechanics of micro-groove machining of 4340 steel

    … in hot embossing molds, micro-heat exchangers, optical lithography masks, micro-forming dies, engineered surface textures, etc. The challenge of achieving such feature is the control of the process parameters to minimize the side burr that often damages the microgroove. Besides, there is a …

    uiuc Repository record for A finite element study of the mechanics of micro-groove machining of 4340 steel (opens in a new tab)

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