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Showing 1 to 1 of 1 for “"Ni, Si1-xGex, Virtual substrate, Growth mode, Interfacial reaction, XPS"”.
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Metallic thin film on SiGe/Si substrates
In this thesis, in-situ XPS and ex-situ AFM have been employed to probe the thermal stability of Si0.8Ge0.2(001) virtual substrate (VS), the interfacial reaction and growth mode of Ni thin film on Si0.8Ge0.2 VS at room temperature (RT), and the germanosilicide phase transformation at high …