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Showing 1 to 4 of 4 for “"Multilayer Mirror"”.
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Reduced density hydrogenated silicon through reactive dc magnetron sputtering with secondary rf plasma discharge for EUV multilayer mirror application
Made available in DSpace on 2019-11-26T20:49:30Z (GMT). No. of bitstreams: 2 UHLIG-THESIS-2019.pdf: 3040065 bytes, checksum: 4444cd75305422a711eb398f1ec5e75c (MD5) LICENSE.txt: 4206 bytes, checksum: 5a9d596ce58190a77714e399a794eb23 (MD5) Previous issue date: 2019-07-18
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Designing, constructing, and testing an X-ray polarimeter
… reflecting these X-rays off of a correctly tuned multilayer mirror at a specific grazing angle. A design for a small spacecraft incorporating this type of instrument has been proposed, but the effectiveness of using multilayer mirrors as polarization filters has never been tested in a laboratory …
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Removal of organic contaminants from lithographic materials
… especially due to carbon growth on the multilayer mirror collectors and to soft defects in the form of organic contamination on the mask. Traditional cleaning methods employ the use of wet chemicals to etch contamination off of a surface, however this is limited in the sub-micron range …
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Debris Characterization And Mitigation Of Droplet Laser Plasma Sources For Euv Lithography
… in the EUVL steppers is reflective optics with multilayer mirror coatings on each surface. The wavelength of choice is 13.5 nm determined by the optimum reflectivity of the mirror coatings. The light source required for this wavelength is derived from a hot-dense plasma produced by either a gas …