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Showing 1 to 1 of 1 for “"Molecular resists"”.

  1. Materials for next-generation lithography: Crosslinked molecular resists and photo-patternable underlayers

    … in order to be realized. In particular, new photoresists will need to be developed that can be patterned at the small feature sizes expected to be used with these new techniques. This thesis will explore both negative and positive-tone crosslinked molecular resists as materials capable of sub-50nm …

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