Global ETD Search

Adhesion of copper to polytetrafluoroethylene surfaces modified with vacuum UV radiation downstream from He and Ar microwave plasmas

Desai, Hrishikesh R.

rit Repository record for Adhesion of copper to polytetrafluoroethylene surfaces modified with vacuum UV radiation downstream from He and Ar microwave plasmas (opens in a new tab)

High quality high current ion beam generation and transport systems including plasma-based space charge neutraliser

Ito, H2003

… had to be minimized by tight opticalcontrol. 5. Microwave plasma sources as ultimate ion source: A microwave source was developed to obtain high current, ultra clean ion beams and long source life. The characteristics of microwave plasmas differ significantly from whose generated by other methods …

salford

Sample introduction and solvent effects in an argon and helium microwave induced plasma

McCleary, Keith AlanVirginia Tech1992

… of solvent loading on the Highly Efficient Microwave Induced Plasma (HEMIP). The magnitude of solvent loading for Ar and He discharges using different sample introduction systems is determined. The solvent load is shown to have two separate constituents: aerosol and vapor. Each of these are …

vt Repository record for Sample introduction and solvent effects in an argon and helium microwave induced plasma (opens in a new tab)

Investigation of microwave cavity applicators for plasma assisted CVD diamond synthesis and plasma assisted combustion

Hemawan, Kadek Wardika2010

Thesis (Ph. D.)--Michigan State University. Electrical Engineering, 2010

msu Repository record for Investigation of microwave cavity applicators for plasma assisted CVD diamond synthesis and plasma assisted combustion (opens in a new tab)