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Showing 1 to 1 of 1 for “"Microplasma: Plasma enhanced atomic layer deposition"”.

  1. Microplasma-driven, atomic layer deposition of flexible electronic and photonic nanofilms

    Atomic Layer Deposition (ALD) of aluminum oxide (Al2O3), gallium oxide (Ga2O3) and Zirconium oxide (ZrO2), driven by arrays of microcavity plasmas (MALD), has been demonstrated. Microplasma has been drawn attention due to its unique characteristics such as high electron density (>1016 cm-3), low …

    uiuc Repository record for Microplasma-driven, atomic layer deposition of flexible electronic and photonic nanofilms (opens in a new tab)