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Showing 1 to 20 of 73 for “"Metal films"”.

  1. Photodetection using ultrathin metal films

    … by exploiting resonant absorption in ultrathin metal films (< 20 nm). Our approach paves the way to implement scalable, lithography-free, and low-cost silicon-based optoelectronics beyond the material bandgap. Light absorption in metal films can excite hot carriers, which are useful for …

    maryland Repository record for Photodetection using ultrathin metal films (opens in a new tab)

  2. Electromigration in thin metal films.

    cambridge

  3. Heteroepitaxial Growth and Morphology of Thin Metal Films

    In the growth of Cu and Co bilayer nanostructures, a metastable fcc alloy was observed to form despite the well-established immiscibility of Cu and Co in the relevant temperature range &sim;600&deg;C. It is established in this study that the alloy forms during the epitaxial growth of Co on Cu by a …

    uiuc Repository record for Heteroepitaxial Growth and Morphology of Thin Metal Films (opens in a new tab)

  4. Quantum Electronic Effects in Ultrathin Metal Films on Semiconductors

    As the size of a metallic system approaches the atomic scale, deviations from the bulk are expected in a plethora of different physical properties due to quantum size effects. In this work, two of these effects are investigated in detail: the structural distortions that arise due to quantum …

    uiuc Repository record for Quantum Electronic Effects in Ultrathin Metal Films on Semiconductors (opens in a new tab)

  5. Interfacial effects on the structure of thin metal films

    Three studies of thin metal films grown on semiconductor and insulator substrates are presented. Thin films grown on a substrate decorated by a periodic array of atomic wires can exhibit unusual properties such as stacking faults and electronic topological phase transitions due to the interfacial …

    uiuc Repository record for Interfacial effects on the structure of thin metal films (opens in a new tab)

  6. Solid state interaction between thin metal films and SiO2 substrate.

    Thin films of Cu, Ir, Mo, Pt, Re, Y, Yb and Zr were vacuum deposited onto Si02 substrates of thermally oxidized Si< 100 > wafers and were annealed in a vacuum tube furnace. Samples were then analysed using Rutherford Backseattering Spectrometry (RBS) and X-Ray Diffraction (XRD) to determine whether …

    zulu Repository record for Solid state interaction between thin metal films and SiO2 substrate. (opens in a new tab)

  7. Temporal dynamics of hot-electrons in metal films and alloys

    … focus on measuring the hot-carrier lifetime in metal films and then offer new approaches for controlling the relaxation time of the excited hot-carriers. For the measurement, we develop our degenerate pump-probe spectroscopy setup using a Ti:Sapphire pulsed laser, enabling us to measure the …

    maryland Repository record for Temporal dynamics of hot-electrons in metal films and alloys (opens in a new tab)

  8. Study of thin metal films and oxide materials for nanoelectronics applications

    Different types of thin metal films and oxide materials are studied for their potential application in nanoelectronics: gold and copper films, nickel nanoelectrodes, oxide nanograin superconductors, carboxyl ferromagnetic microspheres and graphene oxide flakes. The crystallization and surface …

    cambridge Repository record for Study of thin metal films and oxide materials for nanoelectronics applications (opens in a new tab)

  9. On the 1/f noise of atomic-layer-deposition metal films

    … noise for atomic-layer-deposition Pt films. Atomic-layer-deposition has been developed as an approach to make ultra-thin and conformal films. It has been employed to make detectors of bolometers. 1/f noise is a fundamental limit to the resolution. The experiments are designed to …

    mit Repository record for On the 1/f noise of atomic-layer-deposition metal films (opens in a new tab)

  10. Ion Irradiation Induced Roughening and Smoothing of Metal Films on Dielectric Substrates

    … the morphology evolution of ultrathin Pt films on dielectric substrates produced by heavy ion bombardment. The films roughen and form nanopatterns which coarsen in a certain dose range. The microstructure evolution is characterized using AFM, SEM and RBS. The results are explained using a …

    uiuc Repository record for Ion Irradiation Induced Roughening and Smoothing of Metal Films on Dielectric Substrates (opens in a new tab)

  11. Coadsorption of anions and ultra-thin metal films on single crystal electrodes

    … surface analysis of anions and ultra-thin metallic films of copper and silver deposited on single crystal electrodes. The anion and metal coverages from the Auger electron spectroscopy (AES) measurements were compared with results obtained by in situ radiochemical and electrochemical data. …

    uiuc Repository record for Coadsorption of anions and ultra-thin metal films on single crystal electrodes (opens in a new tab)

  12. A scanning tunneling microscopy study of metal films and supported gold particles

    … application of the STM in the study of supported metal particles. The STM was used to study the surface morphology of Au/Pd films that were sputter deposited onto mica and subsequently sintered in air, as well as equilibrium gold particles formed and supported on graphite. New structures were …

    uiuc Repository record for A scanning tunneling microscopy study of metal films and supported gold particles (opens in a new tab)

  13. Two-dimensional and three-dimensional magnetism in ultrathin epitaxial rare-earth metal films

    … of the magnetic behavior of ultrathin epitaxial films of the heavy rare-earth elements; Gd, Er, and Dy, grown with the technique of Molecular Beam Epitaxy (MBE). By employing advanced film fabrication techniques, each magnetic rare-earth element layer, between 0.1 and 10 atomic layers thick and …

    uiuc Repository record for Two-dimensional and three-dimensional magnetism in ultrathin epitaxial rare-earth metal films (opens in a new tab)

  14. Sulfurizing and selenizing metal films in ultra-high vacuum by hydride gas kinetic control

    … well-established method for creation of thin films. The addition of gaseous sources of hydrogen sulfide and hydrogen selenide is not currently a well-documented or common modification to such systems. While the thermodynamics of using such sources for the production of various chalcogenide …

    mit Repository record for Sulfurizing and selenizing metal films in ultra-high vacuum by hydride gas kinetic control (opens in a new tab)

  15. New Chemistry For The Growth Of First-Row Transition Metal Films By Atomic Layer Deposition

    <p>Thin films containing first-row transition metals are widely used in microelectronic, photovoltaic, catalytic, and surface-coating applications. In particular, metallic films are essential for interconnects and seed, barrier, and capping layers in integrated circuitry. Traditional vapor …

    wayne-thes Repository record for New Chemistry For The Growth Of First-Row Transition Metal Films By Atomic Layer Deposition (opens in a new tab)

  16. New precursors and chemistry for the growth of transition metal films by atomic layer deposition

    … contribute to the lack of suitable transition metal precursors available for use in ALD. In this thesis, we report the discovery of a series of novel transition metal diazadienate precursors that promising properties deemed suitable for ALD. The volatility and thermal stability of the new …

    wayne-thes Repository record for New precursors and chemistry for the growth of transition metal films by atomic layer deposition (opens in a new tab)

  17. Characterization of a Viscoelastic Response from Thin Metal Films Deposited on Silicon for Microsystem Applications

    … torsional hinges of silicon covered with thin metal films. The viscoelastic response occurs over a time period of 50 minutes at an operating temperature of 35°C. This viscoelastic phenomenon is similar to that reported in articles addressing anelastic behavior associated with viscous grain …

    calpoly Repository record for Characterization of a Viscoelastic Response from Thin Metal Films Deposited on Silicon for Microsystem Applications (opens in a new tab)

  18. Mechanistic Studies of the Chemical Vapor Deposition of Ceramic and Metal Films From Organometallic Precursors

    Investigations of the thermolysis of tetra(neopentyl)titanium (TiNp$\sb4$) in solution have been carried out in parallel with studies of the chemical mechanism responsible for its conversion to titanium carbide under CVD conditions. A kinetic isotope effect $(k\sb{\rm\alpha (H)}/k\sb{\rm\alpha (D)} …

    uiuc Repository record for Mechanistic Studies of the Chemical Vapor Deposition of Ceramic and Metal Films From Organometallic Precursors (opens in a new tab)

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