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Showing 1 to 20 of 43 for “"Metal Oxide Semiconductor Field Effect Transistor"”.

  1. Resonant Gate Drive Techniques for Power MOSFETs

    … loss mechanism in conventional power MOSFET (Metal-Oxide-Semiconductor Field-Effect Transistor) gate drive circuits is analyzed. Resonant gate drive techniques are investigated and a new resonant gate drive circuit is presented. The presented circuit adds minor complexity to conventional gate …

    vt Repository record for Resonant Gate Drive Techniques for Power MOSFETs (opens in a new tab)

  2. Development of repetitive current controller using raspberry PI for 3 phase active power filter for nonlinear load improvement

    … converts DC to AC waveform. The inverter use Metal Oxide Semiconductor Field Effect Transistor (MOSFET). The Raspberry Pi board is used to supply the pulse width modulation (PWM) signal to the APF. Lastly, the repetitive controller is designed so that the PWM generated is the same signal to be …

    uthm Repository record for Development of repetitive current controller using raspberry PI for 3 phase active power filter for nonlinear load improvement (opens in a new tab)

  3. Comparative analysis of analog LDO design

    … concluded that a Type-B amplifier with n-channel metal oxide semiconductor field effect transistor (MOSFET) output stage or a Type-A amplifier with p channel MOSFET (PMOS) output stage yields the best PSR. Digital LDO regulator topologies have also been discussed. The digital LDO regulator is …

    uiuc Repository record for Comparative analysis of analog LDO design (opens in a new tab)

  4. Tunneling Field-Effect Transistors for Low Power Logic: Design, Simulation and Technology Demonstration

    The tunneling field-effect transistor (TFET) is a promising device candidate to overcome the 60 mV/decade subthreshold swing (S) limitation of the conventional metal-oxide-semiconductor field-effect transistor (MOSFET). TFET exploits gate modulated band-to-band tunneling (BTBT) to achieve a steep S …

    nus Repository record for Tunneling Field-Effect Transistors for Low Power Logic: Design, Simulation and Technology Demonstration (opens in a new tab)

  5. Full band ensemble Monte Carlo simulation of silicon devices

    … approximation Monte Carlo models. A conventional metal-oxide-semiconductor field effect transistor (MOSFET) is simulated as a test case to validate the simulator. Finally, a floating gate memory element (non-volatile memory) is also examined. In this simulation, the Monte Carlo simulator is used …

    uiuc Repository record for Full band ensemble Monte Carlo simulation of silicon devices (opens in a new tab)

  6. A low dispersion 2-GHz comparator

    … awaiting fabrication. Index Terms-Complementary metal oxide semiconductor transistor technology (CMOS technology), very large scale integration (VLSI), application specific integrated circuit (ASIC), silicon germanium (Si-Ge), integrated circuits (IC), automatic test equipment (ATE), personal …

    mit Repository record for A low dispersion 2-GHz comparator (opens in a new tab)

  7. Nanowire Zinc Oxide MOSFET Pressure Sensor

    … kind of pressure sensor using self-assembly Zinc Oxide (ZnO) nanowires on top of the gate of a Metal-Oxide-Semiconductor Field-Effect Transistor (MOSFET) is presented. Self-assembly ZnO nanowires were fabricated with a diameter of 80 nm and 800 nm height (80:8 aspect ratio) on top of the gate of …

    vcu Repository record for Nanowire Zinc Oxide MOSFET Pressure Sensor (opens in a new tab)

  8. Study of subthreshold behavior of FinFet

    The study of subthreshold behavior of Metal Oxide Semiconductor Field Effect Transistor (MOSFET) is critically important in the case of submicron devices for the successful design and implementation of digital circuits. Fin Field Effect Transistor (FinFET) is considered to be an alternate MOSFET …

    unlv Repository record for Study of subthreshold behavior of FinFet (opens in a new tab)

  9. Linear-time 3-D thermal methods for transient electro-thermal simulations

    … two methods. The problem of interest is a large metal-oxide semiconductor field-effect transistor (MOSFET). Simulation results of both LIM and DGM are provided and validated using Ansys Icepak, a commercially available thermal analysis tool. Lastly, some comparisons and future work are provided, …

    uiuc Repository record for Linear-time 3-D thermal methods for transient electro-thermal simulations (opens in a new tab)

  10. The Si/SiO2 Interface Roughness

    The Si/Si02 interface roughness has important effects on the performance of metal-oxide semiconductor field effect transistor devices, which dominate contemporary integrated circuit technology. There have been intense efforts to study this system due to its importance. In this work, a new …

    uiuc Repository record for The Si/SiO2 Interface Roughness (opens in a new tab)

  11. Magnetically controlled chemical potential in field effect devices

    … coupled materials. An aluminium single electron transistor (SET) lithographically fabricated on top of a magnetic gate is used to characterise the chemical potential anisotropy of Ga0 .97Mno. 03As and Gao.941\1no.o6As. The conductance variation of the SET provides a direct probe of the …

    cambridge

  12. Device and circuit-level models for carbon nanotube and graphene nanoribbon transistors

    Metal-oxide semiconductor field-effect transistor (MOSFET) scaling throughout the years has enabled us to pack million of MOS transistors on a single chip to keep in pace with Moore’s Law. After forty years of advances in integrated circuit (IC) technology, the scaling of silicon (Si) MOSFET has …

    cambridge Repository record for Device and circuit-level models for carbon nanotube and graphene nanoribbon transistors (opens in a new tab)

  13. The Si/SiO(2) Interface Roughness

    … Si/SiO$\sb2$ interface roughness has important effects on the performance of metal-oxide-semiconductor field effect transistor devices, which dominate contemporary integrated circuit technology. There have been intense efforts to study this system due to its importance. In this work, a new …

    uiuc Repository record for The Si/SiO(2) Interface Roughness (opens in a new tab)

  14. Techniques for low power analog, digital and mixed signal CMOS integrated circuit design

    … dissertation, several low power complementary metal-oxide-semiconductor (CMOS) integrated circuit design techniques are investigated. A metal-oxide-semiconductor field effect transistor (MOSFET) can be operated at a lower voltage by forward-biasing the source-substrate junction. This approach …

    lsu-thes Repository record for Techniques for low power analog, digital and mixed signal CMOS integrated circuit design (opens in a new tab)

  15. Additive Fabrication and Soft -Lithographic Patterning of Microelectronic Devices

    … vapor deposition (CVD) of platinum and palladium metal films on silicon, which are used extensively in the microelectronics industry to make metal silicide interconnects. The fabrication of platinum silicide Schottky diodes described in chapter 3 demonstrates the efficacy of soft-lithographically …

    uiuc Repository record for Additive Fabrication and Soft -Lithographic Patterning of Microelectronic Devices (opens in a new tab)

  16. Programmable Current Control of Silicon Field Emitter Arrays Using Gate-All-Around MOSFETs

    Silicon field emitter array (FEA) technology has great potential for applications such as electron microscopy, vacuum electronics, and X-ray sources. However, some challenges such as emitter tip burnout and spatial and temporal non-uniformity of emission current impede the adoption of FEAs in these …

    mit Repository record for Programmable Current Control of Silicon Field Emitter Arrays Using Gate-All-Around MOSFETs (opens in a new tab)

  17. Investigation of electrically active defects at the interface of high-k dielectrics and compound semiconductors

    … with high dielectric constant (high-k) gate oxides, for Metal-Oxide-Semiconductor Field Effect Transistor (MOSFET) based devices. The motivation for employing high mobility channel materials is to reduce power dissipation in integrated circuits while also providing improved performance. One …

    cork Repository record for Investigation of electrically active defects at the interface of high-k dielectrics and compound semiconductors (opens in a new tab)

  18. Surge-energy and Overvoltage Robustness of Cascode GaN Power Transistors

    … via avalanche, the GaN high-electron-mobility transistor (HEMT) has no avalanche capability and withstands surge energy by its overvoltage capability. However, a comprehensive study into the surge-energy robustness of the cascode GaN HEMT, a composite device made of a GaN HEMT and a Si …

    vt Repository record for Surge-energy and Overvoltage Robustness of Cascode GaN Power Transistors (opens in a new tab)

  19. High power wide bandgap cascode switching circuits

    Emerging wide bandgap (WBG) power transistors are capable of improving the efficiency of mains voltage power electronic circuits. Several commercial WBG transistors are now available, but all exhibit undesirable gate drive characteristics. The cascode circuit has been suggested as a solution to …

    cambridge Repository record for High power wide bandgap cascode switching circuits (opens in a new tab)

  20. Power Management and Power Conditioning Integrated Circuits for Near-Field Wireless Power Transfer

    Near-field wireless power transfer (WPT) technology facilitates the energy autonomy of heterogeneous systems, significantly augmenting complementary metal-oxide-semiconductor field-effect-transistor (CMOS) technology. In low-power wearable devices, existing power conditioning integrated circuits do …

    cambridge Repository record for Power Management and Power Conditioning Integrated Circuits for Near-Field Wireless Power Transfer (opens in a new tab)

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