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Showing 1 to 1 of 1 for “"Masks (Electronics)"”.
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Photoresist modeling for 365 nm and 257 nm laser photomask lithography and multi-analyte biosensors indexed through shape recognition
Photomasks used in projection lithography systems require higher resolution and uniformity to continue scaling semiconductor devices to smaller dimensions. The lithography process for photomask manufacturing takes many hours to expose millions of individual circuit features into a photoresist. …