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Showing 1 to 5 of 5 for “"Maskless Lithography"”.

  1. Development of an immersion maskless lithography system

    As lithography quickly approaches its limits with current technologies, a host of new ideas is being proposed in hopes of pushing lithography to new levels of performance. The work presented in this thesis explores the use of an immersion scheme to improve the performance of a maskless lithographic …

    mit Repository record for Development of an immersion maskless lithography system (opens in a new tab)

  2. Diffractive optics for maskless lithography and imaging

    … has primarily been driven by the capability of lithography to pattern smaller and smaller features. However due to increasing mask costs and complexity, and increasing tool costs, the state-of-the-art technology in lithography is accessible only to a select few. Zone-plate array lithography

    mit Repository record for Diffractive optics for maskless lithography and imaging (opens in a new tab)

  3. Maskless nanolithography and imaging with diffractive optical arrays

    Semiconductor lithography is at a crossroads. With mask set costs in excess of one million dollars, long mask turn-around times, and tools that are characterized by their inflexibility and skyrocketing costs, there is a need for a new paradigm in lithography. The work presented in this thesis, …

    mit Repository record for Maskless nanolithography and imaging with diffractive optical arrays (opens in a new tab)

  4. A direct-write thick-film lithography process for multi-parameter control of tooling in continuous roll-to-roll microcontact printing

    … ([mu]CP) aims to transform micron-precision soft lithography in a continuous, large-scale, high-throughput process for large-area surface patterning, flexible electronics and engineered meta-surfaces. Efforts to implement this hybrid process have been limited by the inability to monitor and …

    mit Repository record for A direct-write thick-film lithography process for multi-parameter control of tooling in continuous roll-to-roll microcontact printing (opens in a new tab)

  5. Adaptive Aberration Correction for Holographic Projectors

    … for a cost-effective system for holographic lithography. They are characterized using the developed testbed. Using the supersampled Adaptive OSPR algorithm, the diffraction limit was surpassed 2.75 times allowing to increase the patterning area. This combines approaches of Cable, Buckley, …

    cambridge Repository record for Adaptive Aberration Correction for Holographic Projectors (opens in a new tab)