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Showing 1 to 1 of 1 for “"Mask Cleaning"”.

  1. Removal of organic contaminants from lithographic materials

    … in the form of organic contamination on the mask. Traditional cleaning methods employ the use of wet chemicals to etch contamination off of a surface, however this is limited in the sub-micron range of contaminant particles due to lack of transport of sufficient liquid chemical to the surface …

    uiuc Repository record for Removal of organic contaminants from lithographic materials (opens in a new tab)