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Showing 1 to 20 of 167 for “"Magnetron Sputtering"”.
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Novel components by magnetron sputtering
The advent of the closed field unbalanced magnetron sputtering (CFUBMS)technique has provided a novel method for the production of ultra thick (above50(jm) multilayer coatings, which form free standing foils when removed from thesubstrate. Applications for this method range from the production of …
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An Investigation of Target Poisoning during Reactive Magnetron Sputtering
… so called "target poisoning" during magnetron deposition of TiN in an Ar/N2 atmosphere. Investigations include realtime in-situ ion beam analysis of nitrogen incorporation at the Ti sputter target during the deposition process and the analysis of particle uxes towards and from the …
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Nanotermites multicamadas de Al/NiO sintetizadas por Magnetron Sputtering
… form of multilayer thin films, synthesized by magnetron sputtering of Al / NiO with different stoichiometries. Some compositions have shown released amount of heat of about 1.7 kJ /g, which is somewhat below the maximum achieved by similar compositions, which is around 2.44 kJ /g (YAN et al., …
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Magnetic field optimization for high power impulse magnetron sputtering
"High Power Pulsed Magnetron Sputtering (HPPMS) or High Power Impulse Magnetron Sputtering (HiPIMS) is a promising Physical Vapor Deposition technique with several advantages over DC Magnetron Sputtering (dcMS). HiPIMS has gained a lot of interest in the recent years from the coating industries. …
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Fabrication of smart glass electrochromic device using rf magnetron sputtering
… glass for window glazing application by using RF magnetron sputtering. The oxygen flow rate for the deposition is varied from 10sccm -22sccm which is 25%, 27%, 30%, and 35% of oxygen flow. The structures of WO3 were investigated using X-Ray diffraction, Field effect scanning electron microscopy …
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Reactive DC magnetron sputtering of ultrathin superconducting niobium nitride films
DC reactive magnetron sputtering was used to deposit few-nanometer-thick films of niobium nitride for fabrication of superconducting devices. Over 1000 samples were deposited on a variety of substrates, under various chamber conditions. Sheet resistance, thickness and superconducting critical …
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Ion assisted magnetron sputtering of tantalum thin film deposition and characterization
… of tantalum films during their deposition by magnetron sputtering process, and to gain understanding of the mechanism of the ion-solid interactions during the thin film growth. Tantalum (Ta) exists in two distinct crystallographic phases: a stable [alpha]-phase with a body centered cubic (bcc) …
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Investigation and Characterization of Composite Silica Aerogel Nanostructures Obtained Via Magnetron Sputtering
… hydrophilic Silica Aerogel (SA) monoliths using magnetron sputtering, with Cu thicknesses of 20 nm, 50 nm, and 100 nm. Leveraging the mesoporous nanostructure of SA, a Cu-sputtered SA nanocomposite was fabricated, creating a non-homogeneous nanocomposite material. Trace amounts of Cu penetrate up …
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High power impulse magnetron sputtering (HIPIMS) : Fundamental plasma studies and material synthesis.
… technology entitled high power impulse magnetron sputtering (HIPIMS) was suggested. The principle of HIPIMS is to utilize impulses (short pulses) of high power delivered to the target in order to generate high amount of metal ions with degree of metal ionization up to 90% and ions with …
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Design, construction, and optimization of a magnetron sputtering system for urania deposition
A magnetron sputtering system was designed and constructed in accordance with the Nuclear Energy Research Initiative for Consortia (NERI-C) project on the ―Performance of actinide-containing fuel matrices under extreme radiation and temperature environments.‖ The system will initially be used to …
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Linear magnetron high deposition rate magnet pack for high power impulse magnetron sputtering
High Power Impulse Magnetron Sputtering (HiPIMS) or High Power Pulsed Magnetron Sputtering (HPPMS) is a magnetron sputtering method that has proven to be a promising ionized physical vapor deposition (PVD) technique, with industrial implementation hindered by low deposition rates. HiPIMS applies …
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Surface Morphology Evolution of Epitaxial TiN(001) Layers Grown by Reactive Magnetron Sputtering
… TiN layers are grown on MgO(001) by reactive magnetron sputter deposition in pure N$\sb2$ at $\rm650<T\sb{s}<750\sp\circ$C. Without energetic ion bombardment, scanning tunneling microscopy (STM) results show that the development of surface morphology is dominated by growth mounds with an …
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Nucleation Kinetics During Homoepitaxial Growth of Titanium Nitride(001) by Reactive Magnetron Sputtering
… grown on TiN(001) by ultrahigh vacuum reactive magnetron sputtering in pure N2. Nucleation lengths are measured using in-situ scanning tunneling microscopy as a function of temperature and nitrogen gas fraction fN2 in an Ar/N2 gas mixture on two-dimensional islands as well as on large open …
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Fabrication of Zinc Nitride Thin Films using RF Magnetron Sputtering Deposition for Optoelectronic Applications
… work is to grow zinc nitride thin films using RF magnetron sputtering, understand its mechanical, optical, and electrical properties, and investigate its performance as light sensing devices.Synthesis and characterization of zinc nitride thin films has been investigated in this work. An RF …
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Growth and properties of hydrogenated amorphous silicon carbon alloys by DC reactive magnetron sputtering
… alloy films by dc reactive magnetron sputtering (RMS) of a silicon target in a plasma of (Ar + H$\rm\sb2$ + CH$\sb4).$ Films with optical bandgaps of 1.8-2.0 eV and x $\le$ 0.2 have a compact microstructure; no CH$\rm\sb{x}$ groups are detected by their stretching mode …
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Design, fabrication, and characterization of a compact magnetron sputtering system for micro/nano fabrication
… the design, development and testing of a sputtering physical vapor deposition tool, a critical tool in the 1" Fab line of tools.
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Investigation on plasma properties for deposition of titanium nitride film using reactive magnetron sputtering system
Deposition of thin film using plasma sputtering system had been widely discovered and developed extensively for many years in technological and industrial process especially formation of titanium nitride (TiN) films due to its high hardness, good wear resistance, low friction coeffcient and …
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Comparison of high power impulse magnetron sputtering and modulated pulsed power sputtering for interconnect metallization
… of ion flux. In this work, high power impulse magnetron sputtering (HiPIMS) and its derivative, modulated pulsed power (MPP) magnetron sputtering, with their claimed high ionization capability, are proposed for the application of barrier/seed layer deposition. Their plasma properties and metal …
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