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Showing 1 to 8 of 8 for “"MOLECULAR FLUORINE"”.
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Reactive chemisorption of molecular fluorine on Si(100)
Thesis: Ph. D., Massachusetts Institute of Technology, Department of Chemistry, 1989
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The interactions of molecular fluorine and xenon difluoride with silicon
Thesis (Ph.D.)--Massachusetts Institute of Technology, Dept. of Chemistry, 1999.
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The reaction of molecular fluorine with silicon(100) : adsorption, desorption, and scattering dynamics
Thesis: Ph. D., Massachusetts Institute of Technology, Department of Chemistry, 1990
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ΑΝΑΠΤΥΞΗ LASER ΜΟΡΙΑΚΟΥ ΦΘΟΡΙΟΥ ΚΑΙ ΦΩΤΟΔΙΑΣΠΑΣΗ ΤΟΥ HGBR2 ΣΤΑ 157 ΝΜ
A MOLECULAR FLUORINE LASER HAS BEEN DEVELOPED AND ITS OPERATION CHARACTERISTICSHAVE BEEN STUDIED. THE SMALL SIGNAL GAIN COEFFICIENT AND THE SATURATION INTENSITY HAVE BEEN MEASURED USING THE PASSIVE CELL ABSORPTION METHOD AND IN AN OSCILLATOR- AMPLIFIER CONFIGURATION, AND HAVE BEEN FOUND TO BE …
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Theoretical studies of the bonding, energetics and spectra of sulfur and phosphorus halides, and reactivity of divalent sulfur compounds: impact of recoupled pair bonding
… the reactivity of divalent sulfur compounds with molecular fluorine. Previously, researchers had found that the (CH3)2S + F2 reaction proceeded readily with a large rate constant, which is unusual for a reaction between two closed-shell molecules. We were able to explain the interesting …
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VUV 157nm F₂ laser irradiation of micro- and nano-scale particles
… vacuum ultraviolet, VUV, emission from a molecular fluorine gas, F₂, laser. The laser system is introduced and an overview of laser ablation of polymers is presented.Small particles of different materials and sizes, supported on polymeric substrates, are irradiated at a wavelength of …
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The interaction of xenon difluoride with Si(100)
… up to a coverage of about one monolayer (ML). Molecular fluorine has previously been observed to react similarly, saturating the dangling bonds at 1 ML coverage. The thermal desorption products and kinetics from the fluorinated layer produced by XeF2 exposure are identical to that produced by …
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Xenon difluoride etching and molecular oxygen oxidation of silicon by reactive scattering
While both molecular fluorine (F₂) and xenon difluoride (XeF₂) fluorinate Si(l00)2xI surfaces at coverages up to one monolayer, fluorine is unable to cleave Si-Si bonds that ultimately leads to etching silicon at coverages above one monolayer (reaction probability 9x 10-⁴) while XeF₂ does so …