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Showing 1 to 4 of 4 for “"MOCVD-Verfahren"”.

  1. Metallorganische Chemische Gasphasenabscheidung (MOCVD) ferroelektrischer Dünnschichten : Herstellung und Charakterisierung

    … by metal organic chemical vapour deposition (MOCVD). A process has been developed to deposit single-phase PZT based perovskite films with varying barium content, both in polycrystalline form on iridium covered silicon substrates and hetero-epitaxially on strontium ruthenate covered strontium …

    aachen Repository record for Metallorganische Chemische Gasphasenabscheidung (MOCVD) ferroelektrischer Dünnschichten : Herstellung und Charakterisierung (opens in a new tab)

  2. MOVPE growth and characterization of Cr-doped GaN

    In this thesis chromium (Cr) incorporation during GaN growth by metal organic vapor phase epitaxy (MOVPE) was studied for the first time with the intention of producing a dilute magnetic semiconductor (DMS) with room temperature ferromagnetism. To this end the following growth parameters were …

    aachen Repository record for MOVPE growth and characterization of Cr-doped GaN (opens in a new tab)

  3. MOVPE growth and characterization of Al Kappa Ga 1 - Kappa N/GaN heterostructures for HEMT application

    In this thesis the MOVPE growth of AlN, GaN and AlGaN/GaN heterostructures on sapphire substrates was investigated with respect to HEMT application. The prerequisites for excellent HEMT devices were defined with respect to their structural properties: the HEMT structure should consist of a highly …

    aachen Repository record for MOVPE growth and characterization of Al Kappa Ga 1 - Kappa N/GaN heterostructures for HEMT application (opens in a new tab)

  4. New process approaches to metalorganic vapor phase epitaxy of III-nitrides for high power HEMTs

    As a promising candidate for future microwave power devices, GaN-based high-electron mobility transistors (HEMTs) have attracted much research interest. However, group III-nitride growth related issues – predominantly the high defect densities due to lacking lattice matched substrates – limit the …

    aachen Repository record for New process approaches to metalorganic vapor phase epitaxy of III-nitrides for high power HEMTs (opens in a new tab)