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Showing 1 to 1 of 1 for “"Low Pressure Chemically Vapor Deposited Films"”.
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Synthesis and characterization of low pressure chemically vapor deposited boron nitride and titanium nitride films
… nitride (B-C-N-H) and titanium nitride (Ti-N-Cl) films synthesized by low pressure chemical vapor deposition (LPCVD) using ammonia (NH_3)/triethylamine-borane and NH_3/titanium tetrachloride as reactants, respectively.Several analytical methods such as the FTIR, UVNisible spectroscopy, XPS, AES, …