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Search theses and dissertations gathered from participating repositories worldwide. Every result links back to the library that holds it. No account is needed.
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Showing 1 to 20 of 754 for “"Lithography"”.
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Decal Transfer Lithography
U of I Only
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Contact thermal lithography
Contact thermal lithography is a method for fabricating microscale patterns using heat transfer. In contrast to photolithography, where the minimum achievable feature size is proportional to the wavelength of light used in the exposure process, thermal lithography is limited by a thermal diffusion …
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Optimization for advanced lithography
Lithography has always been the most critical process in integrated circuit (IC) fabrication. Below the 28 nm technology node, conventional 193 nm immersion lithography (193i) with single exposure has reached its printability limit. In order to keep up with Moore's law, a lot of advanced …
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Absorbance modulation optical lithography
… the concept of absorbance-modulation optical lithography (AMOL) is described, and the feasibility experimentally verified. AMOL is an implementation of nodal lithography, which is not bounded by the diffraction limit of incident lights. Experimental results showed promising capability of AMOL …
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Automation of soft lithography
… goal is demonstrating manufacturability of soft lithography. Specifically, our target is creating micron scale patterns of resists on a 3 square inch, relatively large area in case of soft lithography, flexible substrate using microcontact printing in order to forming electronic circuit patterns …
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Polymers for Next Generation Lithography
Since the invention of microlithography there has been an exponential increase in the speed and performance of electronic devices with smaller and smaller arrays. Since then, the semiconductor industry has relied on electron beam lithography for sub-micron patterning of integrated circuits. …
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Lithographers' opinions about waterless lithography
1 PDF file (156 pages)
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Interferometric lithography and selected applications
Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1997.
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Defining cellular microenvironments using multiphoton lithography
… high resolution, 3D capabilities of multiphoton lithography. Here, site-specific photochemistry using multiphoton excitation is applied to the photocrosslinking of proteins, providing the means to organize bioactive species into well-defined 3D microenvironments. Further, conditions have been …
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Submicron patterning using laser interference lithography
… nanopatterning technique called Interferometric Lithography (IL) are presented. Comprised of the identical process attributes of traditional projection photolithography, IL mirrors the wafer preparation and development procedures of our existing clean room capabilities. The main departure is …
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Layout decomposition for triple patterning lithography
… limitations, the traditional 193 nm immersion lithography is facing huge challenges in fabricating such tiny features. Several types of next-generation lithography techniques have been discussed for years, such as {\em extreme ultra-violet} (EUV) lithography, {\em E-beam direct write}, and {\em …
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Design automation algorithms for advanced lithography
… keep shrinking, conventional 193 nm immersion lithography (193i) has reached its printability limit. To continue the scaling with Moore's law, different kinds of advanced lithography have been proposed, such as multiple patterning lithography (MPL), extreme ultraviolet (EUV), electron beam …
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Templated Multiferroic Nanocomposites by Ion-Lithography
… of as-grown films are discussed. Second, ion-lithography enabled by the VELION FIB-SEM system is developed to template the perovskite—spinel system. Specifically, fin-shaped BFO—CFO nanocomposite is synthesized by pulsed laser deposition (PLD). Nucleation mechanism of CFO on patterned STO …
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Advanced flow lithography and barcoded particles
… Distinguished with the above techniques, flow lithography (FL) has been emerging as a powerful synthesis tool that enables the creation of microparticles with complex morphologies and chemical patterns. Combining photolithography with microfluidic methods, FL has provided precise control over …
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Electron beam lithography for nano-antenna fabrication
Lithography methods have been used for patterning of small features for decades; in this research project, I examined Electron Beam Lithography (EBL) for fabrication of nano-antennas and then parameterized EBL variables to improve patterning. I overcame difficulties in some steps of this method to …
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Novel resist materials for next generation lithography
… as negative-tone resists for electron beam lithography with impressive capability for high resolution and high plasma etching resistance, due to their carbon-rich nature. Their primary drawback of extremely poor sensitivity has been addressed by implementation of chemical amplification. A …
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Interference lithography for optical devices and coatings
Interference lithography can create large-area, defect-free nanostructures with unique optical properties. In this thesis, interference lithography will be utilized to create photonic crystals for functional devices or coatings. For instance, typical lithographic processing techniques were used to …
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Subsurface two-photon lithography: improvements and applications
Two-photon lithography has previously been used to fabricate a variety of three-dimensional structures where the material is uniform throughout. When performing subsurface controllable refractive index via beam exposure (SCRIBE), two-photon lithography is implemented with a porous material as the …
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Magnetic nanostructures patterned by block copolymer lithography
… into nanosized islands by block copolymer lithography using self assembled polystyrene-polyferrocenyldimethylsilane (PS-PFS) as a mask. The islands reverse their magnetization in a coherent and independent fashion (StonerWohlfarth reversal), in contrast to the continuous film. Micromagnetic …
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