Global ETD Search

Search theses and dissertations gathered from participating repositories worldwide. Every result links back to the library that holds it. No account is needed.

Results

Showing 1 to 6 of 6 for “"Junctionless"”.

  1. NANOSCALE EFFECTS IN JUNCTIONLESS FIELD EFFECT TRANSISTORS

    Though the concept of junctionless field effect transistor (JLFET) is old, it was not possible to fabricate a useful JLFET device, as it requires a very shallow channel region. Very recently, the emergence of new and advanced technologies has made it possible to create viable JLFET devices using …

    siu-theses Repository record for NANOSCALE EFFECTS IN JUNCTIONLESS FIELD EFFECT TRANSISTORS (opens in a new tab)

  2. A study of silicon and germanium junctionless transistors

    … the properties and feasibility of the proposed Junctionless transistor (JNT) have been evaluated for both Silicon and Germanium channels. The performance of Silicon JNTs with 22 nm gate length have been characterized at elevated temperature and stressed conditions. Furthermore, steep …

    cork Repository record for A study of silicon and germanium junctionless transistors (opens in a new tab)

  3. Development of inversion-mode and junctionless Indium-Gallium-Arsenide MOSFETs

    … the development of planar inversion-mode and junctionless Al2O3/In0.53Ga0.47As metal-oxidesemiconductor field-effect transistors (MOSFETs). An implant activation anneal was developed for the formation of the source and drain (S/D) of the inversionmode MOSFET. Fabricated inversion-mode devices …

    cork Repository record for Development of inversion-mode and junctionless Indium-Gallium-Arsenide MOSFETs (opens in a new tab)

  4. FABRICATION AND CHARACTERIZATION OF ACTIVE NANOSTRUCTURES

    … been designed, fabricated and characterized. Junctionless transistors based on highly-doped silicon nanowires fabricated using a bottom-up fabrication approach are first discussed. The fabrication avoids the ion implantation step since silicon nanowires are doped in-situ during growth. …

    purdue-thes Repository record for FABRICATION AND CHARACTERIZATION OF ACTIVE NANOSTRUCTURES (opens in a new tab)

  5. Multigate MOSFETs for digital performance and high linearity, and their fabrication techniques

    … RIE etching, for 3D fin channel formation. InP junctionless FinFETs with record high-aspect-ratio (~ 50:1) fins are demonstrated by this method for the first time. The i-MacEtch process flow eliminates dry-etching-induced plasma damage, high energy ion implantation damage, and high temperature …

    uiuc Repository record for Multigate MOSFETs for digital performance and high linearity, and their fabrication techniques (opens in a new tab)

  6. Electrical detection of atmospheric pollutants and detergents on silicon

    … (NO2), and silicon surfaces on ambipolar silicon junctionless nanowire transistors (Si-JNTs) (Chapter 2). Experimental work and density functional theory (DFT) modelling demonstrate that NO2 functions as a "pseudo" molecular dopant, influencing key device parameters across p-type and n-type …

    cork Repository record for Electrical detection of atmospheric pollutants and detergents on silicon (opens in a new tab)