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Showing 1 to 3 of 3 for “"Ionized Physical Vapor Deposition (IPVD)"”.

  1. Multiscale modeling of thin film deposition processes

    Ionized physical vapor deposition (IPVD) and electrochemical deposition (ECD) are two major thin film deposition processes in the microelectronics industry. The ion fluxes with high kinetic energies in IPVD process involve complex surface interactions that affect overall topology of the microscale …

    mit Repository record for Multiscale modeling of thin film deposition processes (opens in a new tab)

  2. Linear magnetron high deposition rate magnet pack for high power impulse magnetron sputtering

    … method that has proven to be a promising ionized physical vapor deposition (PVD) technique, with industrial implementation hindered by low deposition rates. HiPIMS applies high voltages and high currents at low duty cycles to the sputtering target in order to achieve very high power …

    uiuc Repository record for Linear magnetron high deposition rate magnet pack for high power impulse magnetron sputtering (opens in a new tab)

  3. Comparison of high power impulse magnetron sputtering and modulated pulsed power sputtering for interconnect metallization

    Ionized physical vapor deposition is used to deposit the barrier and seed layers in the state of the art interlevel metallization process. As the critical dimension keeps shrinking, it has become increasingly difficult to use the current techniques to form thin, continuous and stable barrier/seed …

    uiuc Repository record for Comparison of high power impulse magnetron sputtering and modulated pulsed power sputtering for interconnect metallization (opens in a new tab)