Global ETD Search
Search theses and dissertations gathered from participating repositories worldwide. Every result links back to the library that holds it. No account is needed.
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Showing 1 to 7 of 7 for “"Ion beam lithography"”.
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Feasibility study of spatial-phase-locked focused-ion-beam lithography
Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1995.
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Characterization of nanostructured hexagonal boron nitride patterned via high-resolution ion beam lithography
The forefront of polariton research in two-dimensional (2D) materials focuses on pushing the limits of patterning 2D materials into nanoresonators and other nanophotonic structures that manipulate highly confined polaritons for technologically relevant near-IR and mid-IR applications. Furthermore, …
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Characterization of Amorphous Carbon Films for Mask Protection during Ion Beam Bombardment
The field of lithography is in simplest terms the use of a beam, incident on a mask, to transfer the mask pattern onto the substrate. This process is utilized by every semiconductor company to create the microchips, which make modern life possible. Though photons are the industry standard, atom/ion …
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Sub-10-nm lithography with light-ion beams
Scanning-electron-beam lithography (SEBL) is the workhorse of nanoscale lithography in part because of the high brightness of the Schottky source of electrons, but also benefiting from decades of incremental innovation and engineering of apparatus around the Schottky source. Light ions are an …
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Solid state electrochemical processes for nanofabrication
… optics and structural color generation. While the demand for making functional metallic nanostructures for the development and commercialization of new technologies is increasing, there is a need for new manufacturing techniques that allow rapid prototyping or mass production of …
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Optimization of Reactive Ion Etching to Fabricate Silicon Nitride Stencil Masks in SF6 Plasma
Stencil masks are used to print ultra-high resolution patterns using helium ion/atom beam lithography and are often manufactured from thin, free-standing silicon nitride membranes. The masks have sub-200nm openings etched through the thickness of the membrane using a reactive ion etch (RIE) process …
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Two phase magnetoelectric epitaxial composite thin films
… dipole) subsystem: i.e., a change in polarization (P) with application of magnetic field (H), or a change in magnetization (M) with applied electric field (E). Magnetoelectricity can be found both in single phase and composite materials. Compared with single phase multiferroic materials, …