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Showing 1 to 2 of 2 for “"Intermediate Focus"”.
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Diagnosis of the flux emanating from the intermediate focus of an extreme ultraviolet light lithography source
… of energetic species that can damage post-intermediate focus optics and increase the cost of tool ownership. In this paper, the effects of chamber pressure, buffer gas mass, and pinch gas mass on debris transport will be explored using the XTREME XTS 13-35 EUV light source. Utilizing the Sn …
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Detection of energetic neutral flux emanating from extreme ultraviolet light lithography sources
… traditional consequences of a reduced depth of focus. Such a drastic reduction in wavelength is not without any technological hurdles. One such hurdle is the existence of energetic debris emitted by the dense warm plasmas (~1019cm-3, ~30 eV) used to create the EUV light. EUV’s high absorbance …