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Showing 1 to 6 of 6 for “"Indium-Gallium-Zinc oxide"”.

  1. Thin film engineering for transparent thin film transistors

    Zinc oxide (ZnO) and Indium Gallium Zinc Oxide (IGZO) thin films are of interest as oxide semiconductors in thin film transistor (TFT) applications, due to visible light transparency, and low deposition temperature. There is particular interest in ZnO and IGZO based transparent TFT devices …

    nott-trent Repository record for Thin film engineering for transparent thin film transistors (opens in a new tab)

  2. Materials, Device, and System Integration of Amorphous Oxide Semiconductor TFTs

    Amorphous oxide semiconductor (AOS) thin-film transistors (TFTs) have great potential for use in the next-generation of electronics. AOS TFTs can be used to fabricate circuits and sensors on various substrates, due to unique properties, including high mobility, excellent uniformity, and it …

    cambridge Repository record for Materials, Device, and System Integration of Amorphous Oxide Semiconductor TFTs (opens in a new tab)

  3. Heterogeneously Integrated Impedance Based Biosensors

    … integrated biosensors on a complementary metal-oxide semiconductor (CMOS) platform are the limited transducer design and the need for post-processing. To overcome these issues, a heterogeneously integrated system, which employs both CMOS and large-area processing, was proposed and developed. The …

    cambridge Repository record for Heterogeneously Integrated Impedance Based Biosensors (opens in a new tab)

  4. Quantitative Extraction of Bias Stress Parameters in Thin Film Transistors

    … amorphous silicon (a-Si:H) and amorphous indium gallium zinc oxide (a-IGZO), both suffer from a positive threshold voltage shift under the application of a positive gate bias, commonly called positive bias stress (PBS). The most common method for quantifying PBS is a direct current (DC) …

    cambridge Repository record for Quantitative Extraction of Bias Stress Parameters in Thin Film Transistors (opens in a new tab)

  5. Material deposition and laser annealing of metal oxide thin films for electronics fabricated at low temperature

    … thermal-budget fabrication of aluminium doped zinc oxide (AZO) and indium gallium zinc oxide (IGZO) thin films, a dual step fabrication process was studied in this research. Initially, an experimental programme was undertaken to deposit AZO and IGZO films by radio frequency (RF) magnetron …

    nott-trent Repository record for Material deposition and laser annealing of metal oxide thin films for electronics fabricated at low temperature (opens in a new tab)