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Showing 1 to 2 of 2 for “"Hybrid lithography"”.
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Optimization for advanced lithography
Lithography has always been the most critical process in integrated circuit (IC) fabrication. Below the 28 nm technology node, conventional 193 nm immersion lithography (193i) with single exposure has reached its printability limit. In order to keep up with Moore's law, a lot of advanced …
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Algorithms for DFM in electronic design automation
… As the core of manufacturing ICs, conventional lithography systems (193i) reach their limit for the 22 nm technology node and beyond. Consequently, several advanced lithography techniques are proposed, such as multiple patterning lithography (MPL), extreme ultra-violet lithography (EUV), …