Global ETD Search

Chemical vapor deposition and functionalization of fluorocarbon-organosilicon copolymer thin films

Murthy, Shashi Krishna, 1977-Massachusetts Institute of Technology2003

… adhesion to silicon. Chemical vapor deposition (CVD) is an attractive synthetic technique for this application because it is single-step, requires no solvent, and allows conformal coatings to be deposited on substrates with complex topographies and small dimensions. Fluorocarbon-organosilicon …

mit Repository record for Chemical vapor deposition and functionalization of fluorocarbon-organosilicon copolymer thin films (opens in a new tab)

Nanocrystalline diamond growth for top heat-spreading applications on GaN-based devices

Rossi, StefanoUniversität Ulm

ulm-diss Repository record for Nanocrystalline diamond growth for top heat-spreading applications on GaN-based devices (opens in a new tab)

An investigation into the effect of process parameters on carbon film physical properties produced by different deposition techniques

Dehbi-Alaoui, AzzeddineUniversity of Hull1994

… a FAB source, an r.f./d.c. EBPVD system and a hot filament CVD system.The findings of this study indicate that the films produced by the FAB source technique are relatively hard (-2000 HK at 25g). Occasionally some films showed a hardness up to 8000HK due, in part, to elastic recovery during …

hull Repository record for An investigation into the effect of process parameters on carbon film physical properties produced by different deposition techniques (opens in a new tab)